Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP1 | P09874 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | STK10 | O94804 | 3/20 | 0.34 |
| ▸ | SLK | Q9H2G2 | 3/20 | 0.34 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | ELANE | P08246 | 3/20 | 0.32 |
| ▸ | GSK3B | P49841 | 2/20 | 0.32 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.32 |
| ▸ | CTSG | P08311 | 1/20 | 0.32 |
| ▸ | CLK2 | P49760 | 1/20 | 0.32 |
| ▸ | GSK3A | P49840 | 1/20 | 0.32 |
| ▸ | STK33 | Q9BYT3 | 1/20 | 0.32 |
| ▸ | CLK4 | Q9HAZ1 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL241061 | 0.88 | PARP1 (0.42) | PARP1NPSR1CYP1B1GAAMEN1 | |
| SCHEMBL242552 | 0.86 | PARP1 (0.40) | PARP1NPSR1CYP1B1GAAMEN1 | |
| SCHEMBL11204216 | 0.85 | PARP1 (0.58) | PARP1NPSR1CYP1B1GAAMEN1 | |
| SCHEMBL11210705 | 0.83 | PARP1 (0.56) | PARP1NPSR1CYP1B1GAAMEN1 | |
| SCHEMBL28174605 | 0.82 | PARP1 (0.51) | PARP1NPSR1CYP1B1MEN1PKM | |
| SCHEMBL19436979 | 0.81 | PARP1 (0.50) | PARP1NPSR1CYP1B1MEN1PKM | |
| SCHEMBL29030849 | 0.80 | PARP1 (0.49) | PARP1NPSR1CYP1B1ELANECTSG | |
| SCHEMBL9556433 | 0.80 | PARP1 (0.51) | PARP1NPSR1CYP1B1GAAMEN1 | |
| SCHEMBL28287598 | 0.80 | PARP1 (0.51) | PARP1NPSR1MEN1PKMKMT2A | |
| SCHEMBL15557200 | 0.80 | PARP1 (0.51) | PARP1NPSR1CYP1B1GAAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090275694-A1 | Spin-on-Glass Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2009-11-05 | — | — | US | claimed |
| EP-1478681-A4 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INT INC (US) | 2006-10-11 | — | — | EP | claimed |
| EP-1478681-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-24 | — | — | EP | claimed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | claimed |
| EP-1695142-B1 | ANTIREFLECTIVE COATINGS FOR VIA FILL AND PHOTOLITHOGRAPHY APPLICATIONS AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2019-07-31 | — | — | EP | disclosed |
| US-9069133-B2 | Anti-reflective coating for photolithography and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-06-30 | — | — | US | disclosed |
| US-8992806-B2 | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-8889334-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140227538-A1 | Anti-Reflective Coating for Photolithography and Methods of Preparation Thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-08-14 | — | — | US | disclosed |
| US-8642246-B2 | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof | HONEYWELL INTERNATIONAL INC. (US) | 2014-02-04 | — | — | US | disclosed |
| US-20130164677-A1 | Spin-On Anti-Reflective Coatings for Photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-06-27 | — | — | US | disclosed |
| US-8344088-B2 | Spin-on anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. (US) | 2013-01-01 | — | — | US | disclosed |
| EP-1472574-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | Honeywell International, Inc. (US) | 2004-11-03 | — | — | EP | disclosed |
| WO-2004044025-A2 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC (US) | 2004-05-27 | — | — | WO | disclosed |
| WO-2003044078-A9 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INT INC (US) | 2004-01-08 | — | — | WO | disclosed |
| WO-2003044077-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044078-A1 | ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044600-A1 | SPIN-ON ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| WO-2003044079-A1 | SPIN-ON-GLASS ANTI-REFLECTIVE COATINGS FOR PHOTOLITHOGRAPHY | HONEYWELL INTERNATIONAL INC. (US) | 2003-05-30 | — | — | WO | disclosed |
| US-20020095018-A1 | Spin-on-glass anti-reflective coatings for photolithography | HONEYWELL INTERNATIONAL INC. | 2002-07-18 | — | — | US | disclosed |