SCHEMBL2413428

SCHEMBL2413428

O=C1C[C@H]2CC=C[C@H]2O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2413432 1.00
SCHEMBL9737504 0.79 SMN1; SMN2 (0.33)
SCHEMBL17694174 0.75 SMN1; SMN2 (0.30)
SCHEMBL17694176 0.75 SMN1; SMN2 (0.30)
SCHEMBL785507 0.71 SMN1; SMN2 (0.37)
SCHEMBL8930186 0.71
SCHEMBL4092129 0.67
SCHEMBL4092128 0.67
SCHEMBL11553602 0.65 CA1 (0.38)
SCHEMBL11325110 0.65 CA1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2369924-B1 NITROOXY CYCLOALKANE DERIVATIVES MERCK SHARP & DOHME (US) 2014-11-26 EP disclosed
US-8530521-B2 Nitrooxy cycloalkane derivatives MERCK SHARP & DOHME CORP. (US) 2013-09-10 US disclosed
US-20110230532-A1 NITROOXY CYCLOALKANE DERIVATIVES MERCK SHARP & DOHME LLC 2011-09-22 US disclosed
US-7371505-B2 Photosensitive composition and method for forming pattern using the same FUJIFILM CORPORATION (JP) 2008-05-13 US disclosed