SCHEMBL2425102

SCHEMBL2425102

C=CC(=O)OCOC(C)C

nearest known ligand 0.57

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
TSHR P16473 9/20 0.57
HPGD P15428 1/20 0.45
ALDH1A1 P00352 6/20 0.45
TP53 P04637 3/20 0.45
HIF1A Q16665 3/20 0.45
CYP3A4 P08684 3/20 0.45
HSD17B10 Q99714 1/20 0.45
MAPK1 P28482 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
THRB P10828 3/20 0.38
TDP1 Q9NUW8 1/20 0.33
HCAR2 Q8TDS4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28068802 0.85 TSHR (0.55) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL15136058 0.83 TSHR (0.53) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL15493537 0.82 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL5965104 0.82 TSHR (0.52) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1171239 0.81 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL21768581 0.80 TSHR (0.50) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL8188260 0.80 TSHR (0.34) TSHRHCAR2
SCHEMBL268400 0.78 TSHR (0.59) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL2608225 0.78 TSHR (0.67) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL27942529 0.78 TSHR (0.61) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1776399-B1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIV GENT (BE) 2012-11-14 EP claimed
EP-3018151-A1 PROCESS FOR PREPARING INERT RAFT POLYMERS Universiteit Gent (BE) 2016-05-11 EP disclosed
EP-2533100-B1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID-REPELLENT FILM NISSAN CHEMICAL IND LTD (JP) 2014-12-03 EP disclosed
US-8652755-B2 Positive photosensitive resin composition and lyophobic film NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-02-18 US disclosed
US-20130096268-A1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIVERSITEIT GENT (BE) 2013-04-18 US disclosed
US-20130046087-A1 Substituted Cyclodextrin Derivatives Useful As Intermediates For Producing Biologically Active Materials ARCARIOS BV (NL) 2013-02-21 US disclosed
EP-2550299-A2 Substituted cyclodextrin derivatives and process for their preparation Arcarios B.V. (NL) 2013-01-30 EP disclosed
EP-2533100-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LIQUID-REPELLENT FILM Nissan Chemical Industries, Ltd. (JP) 2012-12-12 EP disclosed
US-20120301827-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LYOPHOBIC FILM NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-11-29 US disclosed
WO-2011117317-A2 SUBSTITUTED CYCLODEXTRIN DERIVATIVES USEFUL AS INTERMEDIATES FOR PRODUCING BIOLOGICALLY ACTIVE MATERIALS ARCARIOS BV (NL) 2011-09-29 WO disclosed
US-20080262160-A1 Monodisperse Polymers Containing (Alkyl)Acrylic Acid Moieties, Precursors and Methods for Making them and their Applications UNIVERSITEIT GENT (BE) 2008-10-23 US disclosed
EP-1776399-A1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIVERSITEIT GENT (BE) 2007-04-25 EP disclosed
WO-2006002496-A1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIVERSITEIT GENT (BE) 2006-01-12 WO disclosed