⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL503093 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL8002516 | 0.88 | — | — | |
| SCHEMBL425274 | 0.82 | — | — | |
| SCHEMBL11319175 | 0.78 | — | — | |
| SCHEMBL1325359 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL6901372 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL8672905 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL1357086 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL9515548 | 0.75 | — | — | |
| Cyclohexane SCHEMBL732752 | 0.75 | TSHR (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025100202-A1 | POLYIMIDE, AND POLYIMIDE THIN FILM | 本州化学工業株式会社 | 2025-05-15 | — | — | WO | disclosed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | disclosed |
| WO-2022034907-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | 東ソー株式会社 | 2022-02-17 | — | — | WO | disclosed |
| CN-104321377-A | Urea Compounds for Improving Solid State Properties of Polyamide Resins | BASF SE | 2015-01-28 | — | — | CN | disclosed |