SCHEMBL24254850

Fc1c(F)c(F)c(N(c2c(F)c(F)c(-c3c(F)c(F)c(N(c4c(F)c(F)c(F)c(F)c4F)c4c(F)c(F)c(C(F)(F)F)c(F)c4F)c(F)c3F)c(F)c2F)c2c(F)c(F)c(C(F)(F)F)c(F)c2F)c(F)c1F

nearest known ligand 0.31

Predicted protein targets (top 4)

	gene	UniProt	supporting neighbours	confidence
▸	SMN1; SMN2	Q16637	2/20	0.31

▸	MEN1	O00255	1/20	0.31

▸	KMT2A	Q03164	1/20	0.31

▸	TSHR	P16473	1/20	0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compound	similarity	top predicted	shared targets
SCHEMBL24254848	1.00	SMN1; SMN2 (0.31)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL24254852	0.98	SMN1; SMN2 (0.32)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL24254679	0.93	SMN1; SMN2 (0.33)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL24254665	0.93	SMN1; SMN2 (0.33)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL24254814	0.93	SMN1; SMN2 (0.33)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL24254758	0.90	SMN1; SMN2 (0.32)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL4301076	0.90	SMN1; SMN2 (0.34)	SMN1; SMN2MEN1KMT2ATSHR
SCHEMBL25641625	0.86	—	—
SCHEMBL13789685	0.82	—	—
SCHEMBL24254677	0.82	SMN1; SMN2 (0.38)	SMN1; SMN2MEN1KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

Patent	Title	Assignee	Published	Priority	Filing	Country	Status
EP-4198163-A1	METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN	Tosoh Corporation (JP)	2023-06-21	—	—	EP	disclosed
WO-2022034907-A1	METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN	東ソー株式会社	2022-02-17	—	—	WO	disclosed