⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12937262 | 1.00 | — | — | |
| SCHEMBL12937257 | 1.00 | — | — | |
| SCHEMBL247129 | 1.00 | — | — | |
| SCHEMBL7530006 | 1.00 | — | — | |
| SCHEMBL952288 | 0.95 | — | — | |
| SCHEMBL7174935 | 0.94 | — | — | |
| SCHEMBL247367 | 0.94 | — | — | |
| SCHEMBL14157108 | 0.94 | — | — | |
| SCHEMBL14157195 | 0.94 | — | — | |
| SCHEMBL17747953 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | disclosed |
| WO-2022034907-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | 東ソー株式会社 | 2022-02-17 | — | — | WO | disclosed |