⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9303709 | 1.00 | — | — | |
| SCHEMBL7056990 | 1.00 | — | — | |
| SCHEMBL2621359 | 1.00 | — | — | |
| SCHEMBL278517 | 1.00 | — | — | |
| SCHEMBL16336286 | 1.00 | — | — | |
| Methoxymethane SCHEMBL4465609 | 0.90 | KDM4E (0.36) | — | |
| Acetic Acid SCHEMBL4650043 | 0.86 | KDM4E (0.42) | — | |
| SCHEMBL2691547 | 0.82 | KDM4E (0.32) | — | |
| SCHEMBL7030413 | 0.82 | KDM4E (0.40) | — | |
| SCHEMBL958080 | 0.81 | KDM4E (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260049185-A1 | METHOD FOR MAKING ETHER-FUNCTIONAL SILICONES | DOW SILICONES CORP (US) | 2026-02-19 | — | — | US | disclosed |
| US-8012400-B2 | Surface and site-specific polymerization by direct-write lithography | NORTHWESTERN UNIVERSITY (US) | 2011-09-06 | — | — | US | disclosed |
| EP-1183571-B1 | FLUORINATED PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2010-06-02 | — | — | EP | disclosed |
| EP-2000803-A1 | Nanoparticles with Polymer Shells | Nanosphere, Inc. (US) | 2008-12-10 | — | — | EP | disclosed |
| US-7459262-B2 | Photoimageable, thermosettable fluorinated resists | E. I. DUPONT DE NEMOURS AND COMPANY (US) | 2008-12-02 | — | — | US | disclosed |
| US-20080167202-A1 | SURFACE AND SITE-SPECIFIC POLYMERIZATION BY DIRECT-WRITE LITHOGRAPHY | NORTHWESTERN UNIVERSITY | 2008-07-10 | — | — | US | disclosed |
| EP-1551887-A4 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2008-07-02 | — | — | EP | disclosed |
| US-7326380-B2 | Surface and site-specific polymerization by direct-write lithography | NORTHWESTERN UNIVERSITY (US) | 2008-02-05 | — | — | US | disclosed |
| EP-1855861-A2 | SURFACE AND SITE-SPECIFIC POLYMERIZATION BY DIRECT-WRITE LITHOGRAPHY | NORTHWESTERN UNIVERSITY (US) | 2007-11-21 | — | — | EP | disclosed |
| EP-1135682-B1 | NANOPARTICLES WITH POLYMER SHELLS | NANOSPHERE INC (US) | 2007-07-11 | — | — | EP | disclosed |
| WO-2002079287-A1 | POLYCYCLIC FLUORINE-CONTAINING POLYMERS AND PHOTORESISTS FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-10-10 | — | — | WO | disclosed |
| EP-1135682-A4 | NANOPARTICLES WITH POLYMER SHELLS | NANOSPHERE INC (US) | 2002-09-25 | — | — | EP | disclosed |
| EP-1240554-A2 | NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-09-18 | — | — | EP | disclosed |
| WO-2002044814-A2 | PHOTORESIST COMPOSITIONS COMPRISING BASES AND SURFACTANTS FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |
| WO-2002044845-A2 | PROTECTING GROUPS IN POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |
| EP-1183571-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-03-06 | — | — | EP | disclosed |
| EP-1135682-A1 | NANOPARTICLES WITH POLYMER SHELLS | Nanosphere, Inc. (US) | 2001-09-26 | — | — | EP | disclosed |
| WO-2001037047-A2 | NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-05-25 | — | — | WO | disclosed |
| WO-2000067072-A1 | FLUORINATED POLYMERS, PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-11-09 | — | — | WO | disclosed |
| WO-2000033079-A1 | NANOPARTICLES WITH POLYMER SHELLS | NANOSPHERE, INC. (US) | 2000-06-08 | — | — | WO | disclosed |