Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B3 | P37058 | 7/20 | 0.61 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | MAPT | P10636 | 1/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | HPGD | P15428 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.53 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.53 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.53 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.53 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.53 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.53 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.53 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.53 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.53 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.53 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.53 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.53 |
| ▸ | CES2 | O00748 | 1/20 | 0.51 |
| ▸ | CES1 | P23141 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10877296 | 1.00 | HSD17B3 (0.61) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10875468 | 1.00 | HSD17B3 (0.61) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10877102 | 1.00 | HSD17B3 (0.61) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10879508 | 1.00 | HSD17B3 (0.61) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10879487 | 1.00 | HSD17B3 (0.61) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10874949 | 0.98 | HSD17B3 (0.60) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10872418 | 0.94 | HSD17B3 (0.59) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10871547 | 0.94 | HSD17B3 (0.69) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10870718 | 0.94 | HSD17B3 (0.69) | HSD17B3L3MBTL1LMNAMAPTTDP1 | |
| SCHEMBL10871960 | 0.94 | HSD17B3 (0.69) | HSD17B3L3MBTL1LMNAMAPTTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10162259-B2 | Photoresist composition and color filter using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-12-25 | — | — | US | claimed |
| US-20180074401-A1 | PHOTORESIST COMPOSITION AND COLOR FILTER USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-03-15 | — | — | US | claimed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| CN-119841751-A | Preparation method of oxime ester compound | 四川沃肯精细化工有限公司 | 2025-04-18 | — | — | CN | disclosed |
| CN-119841751-A | Preparation method of oxime ester compound | 四川沃肯精细化工有限公司 | 2025-04-18 | — | — | CN | disclosed |
| CN-119855873-A | Active energy ray-curable resin composition, cured product, and laminate | 荒川化学工业株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119661789-A | Active energy ray-curable composition, cured product, and laminate | 荒川化学工业株式会社 | 2025-03-21 | — | — | CN | disclosed |
| CN-119613716-A | (Meth) acryl-containing polyimide, photosensitive composition, cured product, and article | 荒川化学工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-119505102-A | Active energy ray-curable composition, cured product, and laminate | 荒川化学工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| WO-2025011754-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2025-01-16 | — | — | WO | disclosed |
| CN-118725623-A | Active energy ray-curable composition, active energy ray-curable composition set product, cured product, and laminate | 荒川化学工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| EP-1235863-B1 | USE OF AN ADDITIVE COMPOSITION FOR INCREASING THE STORAGE STABILITY OF ETHYLENICALLY UNSATURATED RESINS | CIBA SC HOLDING AG (CH) | 2005-01-26 | — | — | EP | disclosed |
| CN-1570764-A | Light-sensitive resin composition for black matrix | CHI MEI CORP (CN) | 2005-01-26 | — | — | CN | disclosed |
| US-6733847-B2 | DEPOSITION OF ELECTRON- OR H-DONORS HAVING AT LEAST ONE ETHYLENICALLY UNSATURATED GROUP ON A PLASMA-ACTIVATED SUBSTRATE, CURING BY IONIZATION RADIATION OR ELECTROMAGNETIC ENERGY | CIBA SPECIALTY CHEMICALS CORPORATION | 2004-05-11 | — | — | US | disclosed |
| US-6596445-B1 | Initiators for photopolymerization of radically polymerizable compounds | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-07-22 | — | — | US | disclosed |
| US-20030129322-A1 | Process for the production of strongly adherent surface-coatings by plasma-activated grafting | CIBA SPECIALTY CHEMICALS CORP. | 2003-07-10 | — | — | US | disclosed |
| US-6548121-B1 | Subjecting substrate to action of low-temperature plasma discharge or radiation, applying photoinitiator containing ethylenically unsaturated group, curing, depositing metal or oxide | CIBA SPECIALTY CHEMICALS CORPORATION | 2003-04-15 | — | — | US | disclosed |
| EP-1235863-A1 | ADDITIVE COMPOSITION FOR INCREASING THE STORAGE STABILITY OF ETHYLENICALLY UNSATURATED RESINS | Ciba SC Holding AG (CH) | 2002-09-04 | — | — | EP | disclosed |
| WO-2001042313-A1 | ADDITIVE COMPOSITION FOR INCREASING THE STORAGE STABILITY OF ETHYLENICALLY UNSATURATED RESINS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2001-06-14 | — | — | WO | disclosed |
| EP-0192167-A1 | Use of thio-substitued ketones as photoinitiators | MERCK PATENT GmbH (DE) | 1986-08-27 | — | — | EP | disclosed |