SCHEMBL24413646

SCHEMBL24413646

O=C1OC2C3CC(C2OC(=O)C(F)(F)S(=O)(=O)O)C(C(=O)Oc2ccc(Oc4ccc(I)cc4)cc2)C13

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24409364 0.97 — —
SCHEMBL24414030 0.91 — —
SCHEMBL24413575 0.87 — —
SCHEMBL24409215 0.87 — —
SCHEMBL24409375 0.85 — —
SCHEMBL24408991 0.81 — —
SCHEMBL12309108 0.81 — —
SCHEMBL23351349 0.81 — —
SCHEMBL24409214 0.81 — —
SCHEMBL24408968 0.80 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20220146930-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-05-12 — — US disclosed
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