SCHEMBL2448684

SCHEMBL2448684

C[P+](C)(C)C.[N-]=[N+]=[N-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31364081 0.78 CA1 (0.40)
Isopropyl Alcohol SCHEMBL30124804 0.78
Ethane SCHEMBL29463412 0.72
SCHEMBL9005288 0.71
SCHEMBL29372284 0.71
SCHEMBL165 0.71
SCHEMBL9526624 0.67 CA1 (0.57)
SCHEMBL3836952 0.63
SCHEMBL4232558 0.63 CA1 (0.80)
SCHEMBL674048 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080196626-A1 High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry MERCK PATENT GMBH (DE) 2008-08-21 US claimed
EP-2450412-A1 Silicone coating composition AZ Electronic Materials USA Corp. (US) 2012-05-09 EP disclosed
US-8026040-B2 High silicon-content resin composition used to form thin film thermosets; form low k dielectric constant materials; hard mask and underlayer materials with anti-reflective properties for photolithography industry AZ ELECTRONIC MATERIALS USA CORP. (US) 2011-09-27 US disclosed
EP-2121857-A1 SILICONE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2009-11-25 EP disclosed
WO-2008102256-A1 SILICONE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-08-28 WO disclosed