Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL11224378 | 1.00 | — | — | |
| Bromide SCHEMBL302548 | 1.00 | — | — | |
| Bromide SCHEMBL28684341 | 1.00 | — | — | |
| Bromide SCHEMBL302549 | 1.00 | — | — | |
| Bromide SCHEMBL2584811 | 1.00 | — | — | |
| Bromide SCHEMBL29020589 | 1.00 | CA1 (0.50) | — | |
| Bromide SCHEMBL2069091 | 1.00 | — | — | |
| Bromide SCHEMBL6294266 | 1.00 | — | — | |
| Bromide SCHEMBL82193 | 1.00 | — | — | |
| Bromide SCHEMBL23830 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10991571-B2 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2021-04-27 | — | — | US | claimed |
| EP-2650399-B1 | High temperature atomic layer deposition of silicon oxide thin films | VERSUM MAT US LLC (US) | 2019-09-11 | — | — | EP | claimed |
| US-20190189431-A1 | High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films | VERSUM MATERIALS US, LLC (US) | 2019-06-20 | — | — | US | claimed |
| US-20170256399-A9 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2017-09-07 | — | — | US | claimed |
| US-20160365244-A1 | High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-12-15 | — | — | US | claimed |
| US-20130295779-A1 | HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | claimed |
| EP-2470504-B1 | SYNTHESIS OF PROPIVERINE HYDROCHLORIDE | ANDAGAR RAMAKRISHNA RAMESHA (IN) | 2013-10-16 | — | — | EP | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| EP-2470504-A1 | SYNTHESIS OF PROPIVERINE HYDROCHLORIDE | Andagar Ramakrishna, Ramesha (IN) | 2012-07-04 | — | — | EP | claimed |
| WO-2011114195-A1 | SYNTHESIS OF PROPIVERINE HYDROCHLORIDE | ANDAGAR RAMAKRISHNA RAMESHA (IN) | 2011-09-22 | — | — | WO | claimed |
| US-12584231-B2 | Silver nanoclusters doped with rhodium hydride, manufacturing method thereof, and electrochemical catalyst for hydrogen gas generation | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2026-03-24 | — | — | US | disclosed |
| US-12577693-B2 | High luminous silver nanoclusters doped with metal hydride, manufacturing method thereof, and electrochemical catalyst for hydrogen gas generation | INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) | 2026-03-17 | — | — | US | disclosed |
| US-20250188609-A1 | SEAM-FREE AND CRACK-FREE DEPOSITION | LAM RES CORP (US) | 2025-06-12 | — | — | US | disclosed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | disclosed |
| US-20250014890-A1 | CONFORMAL, CARBON-DOPED SILICON NITRIDE FILMS AND METHODS THEREOF | LAM RESEARCH CORPORATION | 2025-01-09 | — | — | US | disclosed |
| US-20070083012-A1 | Curable polymer compound | SHOWA DENKO K.K. (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1682589-A1 | CURABLE POLYMER COMPOUND | Showa Denko K.K. (JP) | 2006-07-26 | — | — | EP | disclosed |
| WO-2005047346-A1 | CURABLE POLYMER COMPOUND | SHOWA DENKO K.K. (JP) | 2005-05-26 | — | — | WO | disclosed |
| US-5278215-A | Flame-retardant synthetic resin composition and flame retardant | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1994-01-11 | — | — | US | disclosed |
| EP-0506082-A2 | Flame-retardant synthetic resin composition and flame retardant | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1992-09-30 | — | — | EP | disclosed |