⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11255612 | 1.00 | — | — | |
| Bromide SCHEMBL3347505 | 0.97 | CA1 (0.65) | — | |
| Iodide SCHEMBL16416364 | 0.97 | CA1 (0.65) | — | |
| Fluoride SCHEMBL25291743 | 0.97 | CA1 (0.65) | — | |
| Fluoride SCHEMBL2359308 | 0.97 | CA1 (0.65) | — | |
| Fluoride SCHEMBL25257942 | 0.97 | CA1 (0.65) | — | |
| Hydrochloric Acid SCHEMBL934351 | 0.97 | CA1 (0.65) | — | |
| Fluoride SCHEMBL25298173 | 0.94 | CA1 (0.61) | — | |
| Fluoride SCHEMBL5505452 | 0.94 | CA1 (0.61) | — | |
| SCHEMBL2623445 | 0.92 | ESR2 (0.58) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3490 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122080321-A | Antibacterial photo-curing resin composition and preparation method and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-121471247-B | D-pi-A triaryl boron naphthalene derivative with bimodal emission characteristic, and preparation method and application thereof | 潍坊科技学院 | 2026-05-19 | — | — | CN | claimed |
| CN-121574107-A | Method for synthesizing aryl thiobenzothiazole compound based on cuprous chloride | 苏州大学 | 2026-02-27 | — | — | CN | claimed |
| CN-121575421-A | Method for realizing iodobenzene-mediated olefin double-azide reaction by two-phase electrochemical reaction system | 郑州大学第一附属医院 | 2026-02-27 | — | — | CN | claimed |
| CN-119977824-A | Self-crosslinking compound and preparation method and application thereof | 河南省柔性电子产业技术研究院 | 2025-05-13 | — | — | CN | claimed |
| CN-119980263-A | Sun-screening agent, sun-screening composition and preparation method of sun-screening agent | 牛吉娜 | 2025-05-13 | — | — | CN | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| CN-119932584-A | Method for synthesizing 1, 1-diaryl compound by using non-activated olefin | 哈尔滨工业大学(深圳)(哈尔滨工业大学深圳科技创新研究院) | 2025-05-06 | — | — | CN | claimed |
| CN-119875125-A | Carborane modified heat-resistant silicone oil and preparation method thereof | 常州大学 | 2025-04-25 | — | — | CN | claimed |
| CN-117362311-B | Foscoline tetracyclic analogue and preparation method thereof | 南通大学 | 2025-04-04 | — | — | CN | claimed |
| US-4968581-A | High resolution photoresist of imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-11-06 | — | — | US | claimed |
| US-4965361-A | CATALYTIC REACTION OF 4-SUBSTITUTED ARYL IODIDE WITH OLEFIN IN ESTER SOLVENT | EASTMAN KODAK COMPANY (US) | 1990-10-23 | — | — | US | claimed |
| WO-1990010617-A1 | PROCESS FOR PRODUCING 2-ETHYLHEXYL-P-METHOXYCINNAMATE | MALLINCKRODT, INC. (US) | 1990-09-20 | — | — | WO | claimed |
| EP-0388322-A1 | Preparation of 4-substituted aryl olefins | EASTMAN KODAK COMPANY (US) | 1990-09-19 | — | — | EP | claimed |
| WO-1990009973-A1 | PREPARATION OF 4-SUBSTITUTED ARYL OLEFINS | EASTMAN KODAK COMPANY (US) | 1990-09-07 | — | — | WO | claimed |
| US-4912018-A | High resolution photoresist based on imide containing polymers | HOECHST CELANESE CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| US-4810613-A | Blocked monomer and polymers therefrom for use as photoresists | HOECHST CELANESE CORPORATION (US) | 1989-03-07 | — | — | US | claimed |
| EP-0070198-B1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMATION METHOD USING THE SAME | Hitachi, Ltd. (JP) | 1985-06-19 | — | — | EP | claimed |
| US-4503232-A | FROM HALOHYDROCARBON, PRIMARY AMINE, AND CARBON MONOXIDE | AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) | 1985-03-05 | — | — | US | claimed |
| EP-0070198-A1 | Radiation-sensitive composition and pattern-formation method using the same | Hitachi, Ltd. (JP) | 1983-01-19 | — | — | EP | claimed |