SCHEMBL2461841

SCHEMBL2461841

NC(=S)Oc1ccccc1.NC(=S)Oc1ccccc1.[Zn]

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 2/20 0.39
ALDH1A1 P00352 3/20 0.39
TSHR P16473 2/20 0.39
HSD17B10 Q99714 2/20 0.39
TP53 P04637 1/20 0.39
TYR P14679 1/20 0.39
TAS2R38 P59533 1/20 0.39
LTA4H P09960 1/20 0.39
PRSS1 P07477 1/20 0.39
ACR P10323 1/20 0.39
TMPRSS15 P98073 1/20 0.39
ATM Q13315 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
MEN1 O00255 1/20 0.38
KMT2A Q03164 1/20 0.38
HPGD P15428 1/20 0.38
ALOX15 P16050 1/20 0.38
CA5A P35218 1/20 0.37
CA5B Q9Y2D0 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3038674 0.97 TSHR (0.41) PARP10ALDH1A1TSHRHSD17B10TP53
SCHEMBL2784281 0.97 TSHR (0.41) PARP10ALDH1A1TSHRHSD17B10TP53
SCHEMBL6279783 0.95 PARP10 (0.44) PARP10ALDH1A1TSHRHSD17B10TP53
Fluoride SCHEMBL28888580 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53
Methane SCHEMBL11297142 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53
SCHEMBL4437075 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53
Methane SCHEMBL15259544 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53
SCHEMBL11701186 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53
SCHEMBL11117992 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53
SCHEMBL28139913 0.95 PARP10 (0.39) PARP10ALDH1A1TSHRHSD17B10TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103314048-B Olefinic thermoplastic elastomer composition and process for producing the same 橡胶回收技术有限公司 2016-11-23 CN claimed
CN-103314048-A Olefinic thermoplastic elastomer composition and process for producing the same RUBBER RECYCLING THECHNOLOGIES LTD 2013-09-18 CN claimed
CN-113558338-B Anti-skid shoe cover UA托马斯有限公司 2022-12-02 CN disclosed
CN-114381054-A Synthetic polyisoprene latex condom with reduced nitrosamine content 泰日橡胶工业股份有限公司 2022-04-22 CN disclosed
CN-113558338-A Anti-slip shoe cover UA托马斯有限公司 2021-10-29 CN disclosed
CN-107108763-B The nitrile rubber of colour stable 阿朗新科德国有限责任公司 2019-09-06 CN disclosed
CN-105705539-B Copolymer rubber containing nitrile group 阿朗新科德国有限责任公司 2019-07-23 CN disclosed
CN-110023343-A Nitrile-diene-carboxylate copolymer of hydrogenation 阿朗新科德国有限责任公司 2019-07-16 CN disclosed
CN-105873995-B Nitrile-the butadiene rubber and its production method of stable storing 阿朗新科德国有限责任公司 2019-06-21 CN disclosed
CN-105849169-B Phenol-containing hydrogenated nitrile rubber 阿朗新科德国有限责任公司 2019-05-28 CN disclosed
CN-105992797-B Phenol-containing hydrogenated nitrile rubber 阿朗新科德国有限责任公司 2018-11-16 CN disclosed
CN-103080161-A Method for producing nitrile rubbers in organic solvents LANXESS DEUTSCHLAND GMBH 2013-05-01 CN disclosed
CN-103080142-A Method for producing nitrile rubbers in organic solvents LANXESS DEUTSCHLAND GMBH 2013-05-01 CN disclosed
CN-101932611-B Nitrile rubbers which optionally contain alkylthio terminal groups and which are optionally hydrogenated LANXESS DEUTSCHLAND GMBH 2013-03-06 CN disclosed
CN-101679531-B Nitrile rubbers LANXESS DEUTSCHLAND GMBH 2013-02-06 CN disclosed
US-8013084-B2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2011-09-06 US disclosed
CN-101973919-A Method for preparing zinc diphenyl dithiocarbamate Jiangsu feiya chemical industry co ltd 2011-02-16 CN disclosed
CN-101973919-A Method for preparing zinc diphenyl dithiocarbamate Jiangsu feiya chemical industry co ltd 2011-02-16 CN disclosed
EP-2072560-A2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2009-06-24 EP disclosed
US-20090156781-A1 Manufacturing Method and Apparatus of Optical Material SEIKO EPSON CORPORATION (JP) 2009-06-18 US disclosed