⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL5014770 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL4347931 | 1.00 | MEN1 (0.67) | — | |
| Ammonia Solution, Strong SCHEMBL6654670 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL29398 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL3229358 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL4450527 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL8512245 | 0.94 | MEN1 (0.60) | — | |
| Ammonia Solution, Strong SCHEMBL3624789 | 0.88 | MEN1 (0.67) | — | |
| Ammonia Solution, Strong SCHEMBL2535368 | 0.88 | — | — | |
| Ammonia Solution, Strong SCHEMBL10423957 | 0.88 | MEN1 (0.67) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1021 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12492478-B2 | Coated and plated steel sheet or coated and plated steel strip | NIPPON STEEL CORPORATION (JP) | 2025-12-09 | — | — | US | claimed |
| EP-4550387-A1 | SEMICONDUCTOR SUBSTRATE CLEANING COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATES | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-05-07 | — | — | EP | claimed |
| US-20250006502-A1 | POLISHING METHOD FOR GALLIUM NITRIDE WAFER | DISCO CORPORATION (JP) | 2025-01-02 | — | — | US | claimed |
| US-20240229245-A9 | COATED AND PLATED STEEL SHEET OR COATED AND PLATED STEEL STRIP | NIPPON STEEL CORPORATION (JP) | 2024-07-11 | — | — | US | claimed |
| US-20240133041-A1 | COATED AND PLATED STEEL SHEET OR COATED AND PLATED STEEL STRIP | NIPPON STEEL CORP (JP) | 2024-04-25 | — | — | US | claimed |
| WO-2024004980-A1 | SEMICONDUCTOR SUBSTRATE CLEANING COMPOSITION, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATES, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATES | 三菱瓦斯化学株式会社 | 2024-01-04 | — | — | WO | claimed |
| CN-116940711-A | Coated steel sheet or coated steel strip | 日本制铁株式会社 | 2023-10-24 | — | — | CN | claimed |
| WO-2022190173-A1 | COATED AND PLATED STEEL SHEET OR COATED AND PLATED STEEL STRIP | 日本製鉄株式会社 | 2022-09-15 | — | — | WO | claimed |
| CN-107085351-B | Etching solution and photomask processed by etching solution | 关东化学株式会社 | 2022-05-31 | — | — | CN | claimed |
| US-20180099945-A1 | PROCESSES FOR THE PREPARATION OF PESTICIDAL COMPOUNDS | DOW AGROSCIENCES LLC (US) | 2018-04-12 | — | — | US | claimed |
| US-20070128873-A1 | AQUEOUS DISPERSION FOR CMP, POLISHING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-06-07 | — | — | US | claimed |
| CN-1290771-C | Method for continuous preparation of nanometer-sized hydrous zirconia sol | KOREAN RES INST OF CHEMICAL TE (KR) | 2006-12-20 | — | — | CN | claimed |
| US-20060243702-A1 | CMP slurry for metallic film, polishing method and method of manufacturing semiconductor device | TOSHIBA MEMORY CORPORATION (JP) | 2006-11-02 | — | — | US | claimed |
| WO-2006098484-A2 | GRAFT POLYMER | TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) | 2006-09-21 | — | — | WO | claimed |
| US-20050118095-A1 | Method for continuous preparation of nanometer-sized hydrous zirconia sol | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2005-06-02 | — | — | US | claimed |
| US-20040159960-A1 | Electronic device and method of manufacturing the same | HITACHI, LTD. (JP) | 2004-08-19 | — | — | US | claimed |
| EP-1445861-A2 | Electronic device and method of manufacturing the same | Hitachi Ltd. (JP) | 2004-08-11 | — | — | EP | claimed |
| EP-0704435-B1 | PROCESS FOR PRODUCING HYDROQUINONE AND BENZOQUINONE DERIVATIVE | EISAI CO LTD (JP) | 1998-06-24 | — | — | EP | claimed |
| US-5527647-A | FORMING HALFTONE PATTERN ON TRANSPARENT SUBSTRATE | FUJITSU LIMITED (JP) | 1996-06-18 | — | — | US | claimed |
| US-5391589-A | Graft polymerizing a hydrophilic monomer onto a surface radiated substrate; uniformily crosslinking; permanent surface wettability; good wearability | SEIKO EPSON CORPORATION (JP) | 1995-02-21 | — | — | US | claimed |