SCHEMBL2467205

SCHEMBL2467205

CC(C)(C/C=C/C(=O)O)C/C=C/C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.46
GABRR1 P24046 2/20 0.46
GABRR2 P28476 2/20 0.46
BLM P54132 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
GABRR3 A8MPY1 1/20 0.46
LMNA P02545 1/20 0.46
APEX1 P27695 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
TP53 P04637 1/20 0.40
EGLN1 Q9GZT9 1/20 0.40
EGLN3 Q9H6Z9 1/20 0.40
HCAR2 Q8TDS4 3/20 0.34
PPARA Q07869 1/20 0.32
GABRP O00591 2/20 0.32
GABRD O14764 2/20 0.32
GABRA1 P14867 2/20 0.32
GABRB1 P18505 2/20 0.32
GABRG2 P18507 2/20 0.32
GABRB3 P28472 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2467206 1.00 TSHR (0.46) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL11747350 0.88 TSHR (0.41) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL12466056 0.86 TDP1 (0.45) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL12466058 0.86 TDP1 (0.45) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL12466382 0.86 TDP1 (0.45) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL22501108 0.84 TSHR (0.38) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL22501107 0.84 TSHR (0.38) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL3023206 0.84 TSHR (0.46) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL21521060 0.84 TSHR (0.46) TSHRGABRR1GABRR2BLMTDP1
SCHEMBL3023205 0.84 TSHR (0.46) TSHRGABRR1GABRR2BLMTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6998148-B1 Porous materials SHIPLEY COMPANY, L.L.C. (US) 2006-02-14 US claimed
EP-1088848-B1 Porous materials SHIPLEY CO LLC (US) 2005-12-28 EP claimed
US-20050255710-A1 Porous materials SHIPLEY COMPANY, L.L.C. (US) 2005-11-17 US claimed
EP-0938604-B1 PROCESS FOR IMPROVING POLYAMIDE, ACRYLIC, ARAMID, CELLULOSIC AND POLYESTER PROPERTIES, AND MODIFIED POLYMERS PRODUCED THEREBY INTERA TECHNOLOGIES INC (US) 2004-07-14 EP claimed
EP-0891386-A1 AZIDO POLYMERS HAVING IMPROVED BURN RATE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1999-01-20 EP claimed
US-5681904-A EXPLOSIVE; PROPELLANTS; AIR BAGS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-10-28 US claimed
WO-1997036945-A1 AZIDO POLYMERS HAVING IMPROVED BURN RATE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-10-09 WO claimed
US-4999136-A Electroconductive adhesive, acrylated epoxy resin and urethane WESTINGHOUSE ELECTRIC CORP. (US) 1991-03-12 US claimed
EP-0188380-B1 PROTECTIVE COATING FOR PHOTOTOOLS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-07-18 EP claimed
US-4668601-A PHOTOPOLYMERIZABLE ACRYLIC COMPOUND AND EPOXY-FUNCTIONAL SILANE, FREE RADICAL PHOTOINITIATOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1987-05-26 US claimed
US-4623676-A PHOTOCURABLE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-11-18 US claimed
EP-0188380-A2 Protective coating for phototools MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-07-23 EP claimed
US-10352964-B2 Cantilever set for atomic force microscopes, substrate surface inspection apparatus including the same, method of analyzing surface of semiconductor substrate by using the same, and method of forming micropattern by using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-07-16 US disclosed
US-9809706-B2 Racemic drug resolution using polymer supported chiral selector COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) 2017-11-07 US disclosed
US-20170212145-A1 CANTILEVER SET FOR ATOMIC FORCE MICROSCOPES, SUBSTRATE SURFACE INSPECTION APPARATUS INCLUDING THE SAME, METHOD OF ANALYZING SURFACE OF SEMICONDUCTOR SUBSTRATE BY USING THE SAME, AND METHOD OF FORMING MICROPATTERN BY USING THE SAME KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2017-07-27 US disclosed
CN-106432571-A Polymer composition and process for making the same 爱伦环球有限公司 2017-02-22 CN disclosed
US-4668601-A PHOTOPOLYMERIZABLE ACRYLIC COMPOUND AND EPOXY-FUNCTIONAL SILANE, FREE RADICAL PHOTOINITIATOR MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1987-05-26 US disclosed
US-4623676-A PHOTOCURABLE MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-11-18 US disclosed
EP-0188380-A2 Protective coating for phototools MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1986-07-23 EP disclosed
US-4337296-A FREE RADICAL POLYMERIZATION AT INTERFACE OF SUPERIMPOSED LAYERS CONGOLEUM CORPORATION (US) 1982-06-29 US disclosed