⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13719614 | 1.00 | — | — | |
| SCHEMBL1472285 | 0.78 | — | — | |
| SCHEMBL7861114 | 0.75 | — | — | |
| SCHEMBL579026 | 0.71 | — | — | |
| SCHEMBL30336891 | 0.71 | — | — | |
| SCHEMBL8170382 | 0.71 | — | — | |
| SCHEMBL18984850 | 0.71 | — | — | |
| SCHEMBL727821 | 0.71 | — | — | |
| SCHEMBL1470440 | 0.71 | — | — | |
| SCHEMBL8212754 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 878 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4098733-B1 | SOLVENT COMPOSITION, CLEANING METHOD, AND METHOD FOR PRODUCING ARTICLE WITH COATING FILM | AGC INC (JP) | 2026-05-20 | — | — | EP | claimed |
| CN-119977753-A | Process for producing iodofluorocarbon compounds | 阿科玛法国公司 | 2025-05-13 | — | — | CN | claimed |
| US-12183591-B2 | Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-12-31 | — | — | US | claimed |
| EP-4098733-A1 | SOLVENT COMPOSITION, CLEANING METHOD, AND METHOD FOR PRODUCING ARTICLE WITH COATING FILM | AGC INC. (JP) | 2022-12-07 | — | — | EP | claimed |
| US-20220348808-A1 | SOLVENT COMPOSITION, CLEANING METHOD, AND METHOD FOR PRODUCING ARTICLE PROVIDED WITH COATING FILM | AGC Inc. (JP) | 2022-11-03 | — | — | US | claimed |
| US-20220310407-A1 | ETCHING GAS COMPOSITIONS, METHODS OF FORMING MICROPATTERNS, AND METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE | Wonik Materials (KR) | 2022-09-29 | — | — | US | claimed |
| CN-115023490-A | Solvent composition, cleaning method, and method for producing coated article | ＡＧＣ株式会社 | 2022-09-06 | — | — | CN | claimed |
| US-11231205-B2 | Using heat recovered from heat source to obtain high temperature hot water | TRANE INTERNATIONAL INC. (US) | 2022-01-25 | — | — | US | claimed |
| US-20210380859-A1 | EPOXIDE AND FLUORINATED EPOXIDE STABILIZERS FOR FLUOROOLEFINS | THE CHEMOURS COMPANY FC, LLC (US) | 2021-12-09 | — | — | US | claimed |
| WO-2021153681-A1 | SOLVENT COMPOSITION, CLEANING METHOD, AND METHOD FOR PRODUCING ARTICLE WITH COATING FILM | ＡＧＣ株式会社 | 2021-08-05 | — | — | WO | claimed |
| WO-2006009951-A1 | POLYMER RECOVERY METHOD | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2006-01-26 | — | — | WO | claimed |
| WO-2006002132-A2 | OLEFIN POLYMERIZATION PROCESS | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2006-01-05 | — | — | WO | claimed |
| EP-1572751-A2 | POLYMERIZATION PROCESSES | ExxonMobil Chemical Patents Inc. (US) | 2005-09-14 | — | — | EP | claimed |
| EP-1572753-A1 | POLYMERIZATION PROCESSES | ExxonMobil Chemical Patents Inc. (US) | 2005-09-14 | — | — | EP | claimed |
| WO-2005058328-A1 | TETRAHYDROBENZAZEPINES AND THEIR USE IN THE MODULATION OF THE DOPAMINE D3 RECEPTOR | ABBOTT GMBH & CO. KG (DE) | 2005-06-30 | — | — | WO | claimed |
| US-20050107536-A1 | Polymers with new sequence distributions | EXXONMOBIL CHEMICAL PATENTS INC. | 2005-05-19 | — | — | US | claimed |
| US-20050101751-A1 | Halogenated polymers with new sequence distributions | EXXONMOBIL CHEMICAL PATENTS INC. | 2005-05-12 | — | — | US | claimed |
| WO-2004067577-A2 | POLYMERIZATION PROCESSES | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2004-08-12 | — | — | WO | claimed |
| WO-2004058829-A1 | POLYMERIZATION PROCESSES | EXXONMOBIL CHEMICAL PATENTS, INC. (US) | 2004-07-15 | — | — | WO | claimed |
| US-5492792-A | OPTICAL CARD OR DISKS; EXCELLENT LIGHT SENSITIVITY WITHIN NEAR INFRARED REGION AND HEAT RESISTANCE; STORE INFORMATIONSAT HIGH DENSITY | CANON KABUSHIKI KAISHA (JP) | 1996-02-20 | — | — | US | claimed |