SCHEMBL24748

SCHEMBL24748

OCCOCCOCc1ccccc1

nearest known ligand 0.58

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.58
NAAA Q02083 1/20 0.53
KDM4E B2RXH2 1/20 0.48
POLB P06746 1/20 0.48
MEN1 O00255 2/20 0.48
KMT2A Q03164 2/20 0.48
ALDH1A1 P00352 1/20 0.45
RECQL P46063 1/20 0.45
SMN1; SMN2 Q16637 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
LMNA P02545 1/20 0.44
CA1 P00915 3/20 0.44
CA2 P00918 1/20 0.44
CA7 P43166 1/20 0.44
CA9 Q16790 1/20 0.44
HTT P42858 1/20 0.44
MAPK1 P28482 1/20 0.43
IDO1 P14902 1/20 0.43
LTA4H P09960 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Triethylene Glycol SCHEMBL29103842 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL607716 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL16437096 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL599527 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL607698 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL12865302 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL3552086 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL16437099 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL606328 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1
SCHEMBL851320 1.00 TSHR (0.58) TSHRNAAAKDM4EPOLBMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2277 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6436153-B1 None US claimed
CN-122077251-A Lead-free halogen-free soldering paste for QFN device and preparation method thereof 2026-05-26 CN claimed
EP-4730966-A1 METAL OXIDE COMPOSITION, LIGHT-EMITTING DEVICE PRODUCED USING THE METAL OXIDE COMPOSITION, ELECTRONIC APPARATUS INCLUDING THE LIGHT-EMITTING DEVICE, AND ELECTRONIC DEVICE INCLUDING THE LIGHT-EMITTING DEVICE Samsung Display Co., Ltd. (KR) 2026-04-22 EP claimed
US-20260103636-A1 METAL OXIDE COMPOSITION, LIGHT-EMITTING DEVICE PRODUCED USING THE METAL OXIDE COMPOSITION, ELECTRONIC APPARATUS INCLUDING THE LIGHT-EMITTING DEVICE, AND ELECTRONIC DEVICE INCLUDING THE LIGHT-EMITTING DEVICE SAMSUNG DISPLAY CO LTD (KR) 2026-04-16 US claimed
US-20260028500-A1 SEALING FILM COMPOSITIONS FOR SEALING MICROCELLS OF ELECTROOPTIC DEVICES E INK CORP (US) 2026-01-29 US claimed
US-12497534-B2 Sealing film compositions for sealing microcells of electro-optic devices E INK CORPORATION (US) 2025-12-16 US claimed
CN-120059751-A Etching composition, semiconductor device and etching method 珠海基石科技有限公司 2025-05-30 CN claimed
WO-2025064522-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-03-27 WO claimed
US-20250101303-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2025-03-27 US claimed
CN-111936936-B Imidazolidinone-containing compositions for removal of post-ash residues and/or for oxide etching of TiN-containing layers or masks 巴斯夫欧洲公司 2025-02-21 CN claimed
US-6436153-B2 FREE OF OXIDASES AND OXIDOREDUCTASES; HAIR DYE L'ORéAL S.A. (FR) 2002-08-20 US claimed
US-20020046431-A1 Composition for the oxidation dyeing of keratinous fibers comprising at least one oxidation dye and at least one cationic amphiphilic polymer, and dyeing methods LAURENT FLORENCE (FR) 2002-04-25 US claimed
US-6372410-B1 FOR USE IN PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS; FOR REMOVING RESIST RESIDUES REMAINING AFTER ETCHING OR ASHING MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-04-16 US claimed
US-6371994-B2 HAIR DYES L'OREAL S.A. (FR) 2002-04-16 US claimed
US-20020013971-A1 OXIDATION DYEING COMPOSITION FOR KERATIN FIBRES MAUBRU MIREILLE (FR) 2002-02-07 US claimed
US-20020004955-A1 DYE COMPOSITION FOR KERATIN FIBERS, WITH A CATIONIC DIRECT DYE AND A POLYOL OR POLYOL ETHER L' OREAL S.A. 2002-01-17 US claimed
US-20020002748-A1 COMPOSITION FOR THE DIRECT DYEING OF KERATIN FIBRES WITH A CATIONIC DIRECT DYE AND A POLYOL AND/OR A POLYOL ETHER L'OREAL S.A. 2002-01-10 US claimed
US-6241912-B1 Sheet metal deformation brightener composition HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 2001-06-05 US claimed
CN-1296064-A Photoresist cleaning composition MITSUBISHI GAS CHEMICAL K K (JP) 2001-05-23 CN claimed
EP-1091254-A2 Resist stripping composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-04-11 EP claimed