SCHEMBL2476468

SCHEMBL2476468

[Al].[KH].[P]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL732998 0.82
SCHEMBL50272 0.82
SCHEMBL3468474 0.82
SCHEMBL3263916 0.67
SCHEMBL2474718 0.67
SCHEMBL906196 0.67
SCHEMBL8903580 0.67
Fluoride SCHEMBL7701618 0.67
Water SCHEMBL11398884 0.67
SCHEMBL10978757 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8317909-B2 Compositions and processes for deposition of metal ions onto surfaces of conductive substrates DFHS, LLC (US) 2012-11-27 US disclosed
WO-2011112565-A1 COMPOSITIONS AND PROCESSES FOR DEPOSITION OF METAL IONS ONTO SURFACES OF CONDUCTIVE SUBSTRATES DFHS, LLC (US) 2011-09-15 WO disclosed
US-20100154673-A1 COMPOSITIONS AND PROCESSES FOR DEPOSITION OF METAL IONS ONTO SURFACES OF CONDUCTIVE SUBSTRATES DFHS, LLC (US) 2010-06-24 US disclosed
EP-2155927-A1 DEPOSITION OF METAL IONS ONTO SURFACES OF CONDUCTIVE SUBSTRATES DFHS, LLC (US) 2010-02-24 EP disclosed
WO-2008151173-A1 DEPOSITION OF METAL IONS ONTO SURFACES OF CONDUCTIVE SUBSTRATES DFHS, LLC (US) 2008-12-11 WO disclosed
US-20080302267-A1 COMPOSITIONS AND PROCESSES FOR DEPOSITION OF METAL IONS ONTO SURFACES OF CONDUCTIVE SUBSTRATES DFHS, LLC 2008-12-11 US disclosed
US-4347325-A SLURRYING POTASSIUM, ALUMINUM, PHOSPHATE SOURCES; SETTING OR CURING STAUFFER CHEMICAL COMPANY (US) 1982-08-31 US disclosed
EP-0053422-A1 Potassium-aluminum-phosphate compositions, process for the preparation thereof as well as articles and coatings made from said compositions STAUFFER CHEMICAL COMPANY (US) 1982-06-09 EP disclosed