⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6963 | 0.97 | — | — | |
| SCHEMBL15355768 | 0.97 | — | — | |
| SCHEMBL15717118 | 0.97 | OR51E2 (0.53) | — | |
| SCHEMBL193026 | 0.97 | — | — | |
| SCHEMBL264859 | 0.97 | — | — | |
| SCHEMBL4405633 | 0.94 | — | — | |
| Hydrochloric Acid SCHEMBL10677830 | 0.94 | — | — | |
| Water SCHEMBL19183321 | 0.94 | — | — | |
| Ammonia Solution, Strong SCHEMBL7625617 | 0.94 | — | — | |
| Bicarbonate SCHEMBL21899730 | 0.94 | OR51E2 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1655132-B2 | Positive photosensitive lithographic printing plate | AGFA GRAPHICS NV (BE) | 2017-08-23 | — | — | EP | disclosed |
| EP-1747884-B2 | Positive photosensitive lithographic printing plate | AGFA GRAPHICS NV (BE) | 2017-08-23 | — | — | EP | disclosed |
| EP-1464487-B2 | Method of making a positive photosensitive lithographic printing plate | AGFA GRAPHICS NV (BE) | 2017-05-17 | — | — | EP | disclosed |
| EP-1464487-B1 | Method of making a positive photosensitive lithographic printing plate | AGFA GRAPHICS NV (BE) | 2015-05-06 | — | — | EP | disclosed |
| EP-1747884-B1 | Positive photosensitive lithographic printing plate | AGFA GRAPHICS NV (BE) | 2011-10-12 | — | — | EP | disclosed |
| EP-1655132-B1 | Positive photosensitive lithographic printing plate | AGFA GRAPHICS NV (BE) | 2011-10-12 | — | — | EP | disclosed |
| EP-1747884-A2 | Positive photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 2007-01-31 | — | — | EP | disclosed |
| EP-1655132-A2 | Positive photosensitive lithographic printing plate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2006-05-10 | — | — | EP | disclosed |
| EP-0897134-B1 | Positive photosensitive composition, photosensitive lithographic printing plate and method for forming a positive image | MITSUBISHI CHEM CORP (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-0823327-B1 | Method for making positive photosensitive lithographic printing plate | MITSUBISHI CHEM CORP (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-6808861-B1 | SUITABLE FOR DIRECT PLATE MAKING BY MEANS OF A SEMICONDUCTOR LASER OR A YAG LASER | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-10-26 | — | — | US | disclosed |
| EP-1464487-A2 | Positive photosensitive composition and positive photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 2004-10-06 | — | — | EP | disclosed |
| US-20020146635-A1 | Positive photosensitive composition positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate | MITSUBISHI CHEMICAL CORPORATION (JP) | 2002-10-10 | — | — | US | disclosed |
| US-6410207-B1 | USING ALKALI DEVELOPER | MITSUBISHI CHEMICAL CORPORATION (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6326122-B1 | HEAT SENSITIVE ELEMENTS | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-12-04 | — | — | US | disclosed |
| US-6110646-A | Positive photosensitive composition, photosensitive lithographic printing plate and method for forming a positive image | MITSUBISHI CHEMICAL CORPORATION (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-0897134-A2 | Positive photosensitive composition, photosensitive lithographic printing plate and method for forming a positive image | Mitsubishi Chemical Corporation (JP) | 1999-02-17 | — | — | EP | disclosed |
| US-5814431-A | AMINE COMPOUND FOR CURING NOVOLAK OR POLYVINYLPHENOL RESIN RESIN AND CYANINE OR POLYMETHINE DYES | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-09-29 | — | — | US | disclosed |
| EP-0823327-A2 | Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1998-02-11 | — | — | EP | disclosed |
| EP-0784233-A1 | Photosensitive composition and lithographic printing plate | Mitsubishi Chemical Corporation (JP) | 1997-07-16 | — | — | EP | disclosed |