⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8030687 | 0.97 | — | — | |
| SCHEMBL11019322 | 0.97 | — | — | |
| Cyclopropane SCHEMBL7288568 | 0.97 | — | — | |
| SCHEMBL28648119 | 0.97 | — | — | |
| Methane SCHEMBL6833942 | 0.94 | — | — | |
| Methane SCHEMBL2058152 | 0.94 | — | — | |
| SCHEMBL29465837 | 0.90 | — | — | |
| SCHEMBL22568 | 0.90 | — | — | |
| SCHEMBL5670370 | 0.90 | — | — | |
| SCHEMBL17240310 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3906441-A1 | LIQUID PHOTOPOLYMER RESIN COMPOSITIONS FOR FLEXOGRAPHIC PRINTING | Macdermid Graphics Solutions, LLC (US) | 2021-11-10 | — | — | EP | disclosed |
| US-10962703-B1 | Nanoparticle dispersion for increasing optical index of refraction | FACEBOOK TECHNOLOGIES, LLC (US) | 2021-03-30 | — | — | US | disclosed |
| WO-2020142579-A1 | LIQUID PHOTOPOLYMER RESIN COMPOSITIONS FOR FLEXOGRAPHIC PRINTING | MACDERMID GRAPHICS SOLUTIONS, LLC (US) | 2020-07-09 | — | — | WO | disclosed |
| US-20200207142-A1 | Liquid Photopolymer Resin Compositions for Flexographic Printing | MACDERMID GRAPHICS SOLUTIONS LLC | 2020-07-02 | — | — | US | disclosed |
| US-10683393-B2 | Methods of solid freeform fabrication | RICOH CO., LTD. (JP) | 2020-06-16 | — | — | US | disclosed |
| US-20190071583-A1 | Method for Solid Freeform Fabrication | RICOH COMPANY, LTD. (JP) | 2019-03-07 | — | — | US | disclosed |
| US-10066119-B2 | Method for solid freeform fabrication | RICOH CO., LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| EP-2866030-B1 | POLYMERS FOR USE IN CENTRIFUGAL SEPARATION OF LIQUIDS | UNIV CALIFORNIA (US) | 2018-03-21 | — | — | EP | disclosed |
| US-20170260328-A1 | Methods for Solid Freeform Fabrication | RICOH CO., LTD. (JP) | 2017-09-14 | — | — | US | disclosed |
| US-9695280-B2 | Methods for solid freeform fabrication | RICOH CO., LTD. (JP) | 2017-07-04 | — | — | US | disclosed |
| EP-3064340-A2 | METHOD FOR SOLID FREEFORM FABRICATION | Ricoh Company, Ltd. (JP) | 2016-09-07 | — | — | EP | disclosed |
| US-9248447-B2 | Polymers for use in centrifugal separation of liquids | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2016-02-02 | — | — | US | disclosed |
| US-20150139868-A1 | Polymers For Use In Centrifugal Separation Of Liquids | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA | 2015-05-21 | — | — | US | disclosed |
| EP-2866030-A1 | Polymers for use in centrifugal separation of liquids | The Regents of The University of California (US) | 2015-04-29 | — | — | EP | disclosed |
| EP-2373995-A2 | POLYMERS FOR USE IN CENTRIFUGALSEPARATION OF LIQUIDS | The Regents of the University of California (US) | 2011-10-12 | — | — | EP | disclosed |
| WO-2010077534-A2 | POLYMERS FOR USE IN CENTRIFUGALSEPARATION OF LIQUIDS | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2010-07-08 | — | — | WO | disclosed |
| US-20090139937-A1 | Polymers for Use in Centrifugal Separation of Liquids | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2009-06-04 | — | — | US | disclosed |
| US-20070043205-A1 | Radiation curable thiol-ene composition | DSM IP ASSETS B.V. (NL) | 2007-02-22 | — | — | US | disclosed |
| EP-1622963-A2 | RADIATION CURABLE THIOL-ENE COMPOSITION | DSM IP Assets B.V. (NL) | 2006-02-08 | — | — | EP | disclosed |
| WO-2004101649-A2 | RADIATION CURABLE THIOL-ENE COMPOSITION | DSM IP ASSETS B.V. (NL) | 2004-11-25 | — | — | WO | disclosed |