Known targets — ChEMBL curated mechanism
ADRB1CDK4CDK6CHRM2CHRM3DPP4DRD2DRD3DRD4EGFRHRH1HTR1BHTR1DHTR1FHTR2AHTR2CHTR4SLC6A2SLC6A4
The experimentally established mechanism targets of Succinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | EGLN1 | Q9GZT9 | 2/20 | 0.45 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.45 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.45 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.43 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.43 |
| ▸ | OR51E2 | Q9H255 | 2/20 | 0.42 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | SLC13A3 | Q8WWT9 | 1/20 | 0.42 |
| ▸ | PPARG | P37231 | 9/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | RXRA | P19793 | 2/20 | 0.40 |
| ▸ | OXER1 | Q8TDS5 | 2/20 | 0.40 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL419451 | 0.89 | — | — | |
| SCHEMBL16660 | 0.89 | — | — | |
| Acetone SCHEMBL23040795 | 0.84 | GRIK1 (0.39) | LMNAFFAR3ALDH1A1TDP1 | |
| Ethylene SCHEMBL7184469 | 0.84 | GRIK1 (0.39) | LMNAFFAR3ALDH1A1TSHRALOX15 | |
| SCHEMBL9340600 | 0.82 | GRIK1 (0.38) | FFAR3 | |
| Phosphoric Acid SCHEMBL1137771 | 0.80 | GRIK1 (0.36) | LMNAFFAR3KMT2ATSHRTDP1 | |
| SCHEMBL5698422 | 0.80 | GRIK1 (0.41) | LMNAFFAR3ALOX15HSD17B10 | |
| Phosphoric Acid SCHEMBL1137734 | 0.80 | GRIK1 (0.36) | LMNAFFAR3KMT2ATSHRTDP1 | |
| SCHEMBL28327430 | 0.78 | GRIK1 (0.48) | LMNAEGLN1ALKBH5SUCNR1FFAR3 | |
| Methacrylic Acid SCHEMBL8824600 | 0.78 | GRIK1 (0.35) | TDP1ALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3288105-B1 | BINDER FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY ELECTRODES AND USE OF SAME | TOAGOSEI CO LTD (JP) | 2020-07-15 | — | — | EP | disclosed |
| US-20180102542-A1 | BINDER FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY ELECTRODE, AND USE THEREOF | TOAGOSEI CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |
| EP-3288105-A1 | BINDER FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERY ELECTRODES AND USE OF SAME | Toagosei Co., Ltd. (JP) | 2018-02-28 | — | — | EP | disclosed |
| US-20150191693-A1 | PROCESS FOR MODIFYING A POLYMERIC SURFACE | POLYMERS CRC LTD. (AU) | 2015-07-09 | — | — | US | disclosed |
| EP-2867285-A1 | PROCESS FOR MODIFYING A POLYMERIC SURFACE | Polymers CRC Limited (AU) | 2015-05-06 | — | — | EP | disclosed |
| WO-2014000052-A1 | PROCESS FOR MODIFYING A POLYMERIC SURFACE | POLYMERS CRC LTD. (AU) | 2014-01-03 | — | — | WO | disclosed |
| EP-1410109-B1 | PHOTOSENSITIVE RESIN COMPOSITION | BASF SE (DE) | 2011-10-26 | — | — | EP | disclosed |
| US-7829257-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORP. (US) | 2010-11-09 | — | — | US | disclosed |
| US-7556843-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2009-07-07 | — | — | US | disclosed |
| US-7425585-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2008-09-16 | — | — | US | disclosed |
| US-20070259278-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2007-11-08 | — | — | US | disclosed |
| US-20070249748-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2007-10-25 | — | — | US | disclosed |
| US-7247659-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-07-24 | — | — | US | disclosed |
| US-20040192804-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2004-09-30 | — | — | US | disclosed |
| EP-1410109-A1 | PHOTOSENSITIVE RESIN COMPOSITION | Ciba SC Holding AG (CH) | 2004-04-21 | — | — | EP | disclosed |
| WO-2003010602-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-02-06 | — | — | WO | disclosed |
| US-6485885-B1 | Photopolymerizable thermosetting resin compositions | CIBA SPECIALTY CHEMICALS CORPORATION | 2002-11-26 | — | — | US | disclosed |
| US-20020020832-A1 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORP. | 2002-02-21 | — | — | US | disclosed |
| EP-1095313-A1 | PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITIONS | Ciba SC Holding AG (CH) | 2001-05-02 | — | — | EP | disclosed |
| WO-2000000869-A1 | PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITIONS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2000-01-06 | — | — | WO | disclosed |