⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL248636 | 1.00 | — | — | |
| SCHEMBL14602162 | 0.85 | HSD17B10 (0.57) | — | |
| SCHEMBL12575280 | 0.80 | KDM4E (0.37) | — | |
| Methoxymethane SCHEMBL728290 | 0.79 | HSD17B10 (0.57) | — | |
| SCHEMBL10073780 | 0.78 | — | — | |
| SCHEMBL5528595 | 0.78 | — | — | |
| SCHEMBL35798 | 0.78 | — | — | |
| SCHEMBL5524685 | 0.78 | — | — | |
| Propylene Glycol SCHEMBL11904932 | 0.78 | TDP1 (0.56) | — | |
| SCHEMBL16152172 | 0.77 | HSD17B10 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9164383-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | claimed |
| US-9091914-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-28 | — | — | US | claimed |
| US-20120208125-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-16 | — | — | US | claimed |
| US-20120208127-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-16 | — | — | US | claimed |
| US-10095108-B2 | Photosensitive composition and pattern formation method | Evolving nano process infrastructure Development Center, Inc. (JP) | 2018-10-09 | — | — | US | disclosed |
| US-20170277036-A1 | PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD | Evolving nano process infrastructure Development Center, Inc. (JP) | 2017-09-28 | — | — | US | disclosed |
| US-9274425-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-03-01 | — | — | US | disclosed |
| US-9164383-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9091914-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20150099228-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-09 | — | — | US | disclosed |
| US-20120208125-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-16 | — | — | US | disclosed |
| US-20120208127-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-08-16 | — | — | US | disclosed |