SCHEMBL2491295

SCHEMBL2491295

NN[SiH2]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5535544 0.64
SCHEMBL2355551 0.61
SCHEMBL1397136 0.61
SCHEMBL28200841 0.59
SCHEMBL26964051 0.56
SCHEMBL9475278 0.56
SCHEMBL155958 0.56
SCHEMBL25242943 0.56
SCHEMBL8343425 0.53
Ammonia Solution, Strong SCHEMBL2423317 0.53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2438119-B1 COMPOSITION HAVING IMPREGNATING EFFECT WERNER & MERTZ GMBH (DE) 2014-09-24 EP claimed
EP-2365021-B1 Method for producing amine-amide functional siloxanes EVONIK GOLDSCHMIDT GMBH (DE) 2013-05-08 EP claimed
EP-1893802-B1 SILOXANE-CONTAINING FORMULATION FOR REDUCING CREASE FORMATION HENKEL AG & CO KGAA (DE) 2011-10-05 EP claimed
EP-1893802-B1 SILOXANE-CONTAINING FORMULATION FOR REDUCING CREASE FORMATION HENKEL AG & CO KGAA (DE) 2011-10-05 EP disclosed
EP-1893802-A1 SILOXANE-CONTAINING FORMULATION FOR REDUCING CREASE FORMATION HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2008-03-05 EP disclosed
WO-2006136382-A1 SILOXANE-CONTAINING FORMULATION FOR REDUCING CREASE FORMATION HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2006-12-28 WO disclosed
US-4644074-A AGAINST DEGRADATION BY KAOLIN CLAY BY ADDING AN AMINE SWS SILICONES CORPORATION (US) 1987-02-17 US disclosed