SCHEMBL249299

SCHEMBL249299

C=C(C)C(=O)OC(CO)CC(F)(F)C(F)(F)CC(CO)OC(=O)C(=C)C

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.34
PRKCA P17252 1/20 0.33
THRB P10828 1/20 0.31
TGFBR1 P36897 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL246932 0.93 TSHR (0.34) TSHRALDH1A1PRKCA
SCHEMBL7767145 0.93 TSHR (0.34) TSHRALDH1A1PRKCA
SCHEMBL7774870 0.92 TSHR (0.33) TSHRALDH1A1PRKCA
SCHEMBL7772710 0.92 TSHR (0.33) TSHRALDH1A1PRKCA
SCHEMBL868980 0.88 TSHR (0.31) TSHR
SCHEMBL247729 0.87 TSHR (0.41) TSHRPRKCATHRB
SCHEMBL7771354 0.85 TSHR (0.42) TSHRPRKCATHRB
SCHEMBL7772705 0.85 TSHR (0.42) TSHRPRKCATHRB
SCHEMBL7772702 0.84 TSHR (0.41) TSHRPRKCATHRB
SCHEMBL7774885 0.84 TSHR (0.41) TSHRPRKCATHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9389339-B2 Method for producing antireflection film, antireflection film, and coating composition FUJIFILM CORPORATION (JP) 2016-07-12 US disclosed
US-20160187540-A2 METHOD FOR PRODUCING ANTIREFLECTION FILM, ANTIREFLECTION FILM, AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2016-06-30 US disclosed
US-8679578-B2 Method of manufacturing anti-reflection film, anti-reflection film and coating composition FUJIFILM CORPORATION (JP) 2014-03-25 US disclosed
US-20130084442-A1 METHOD OF MANUFACTURING ANTI-REFLECTION FILM, ANTI-REFLECTION FILM AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2013-04-04 US disclosed
US-20120270021-A1 METHOD FOR PRODUCING ANTIREFLECTION FILM, ANTIREFLECTION FILM, AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2012-10-25 US disclosed
US-20120207992-A1 PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 US disclosed
US-20120207990-A1 PRODUCTION METHOD OF ANTIREFLECTION FILM, ANTIREFLECTION FILM AND COATING COMPOSITION FUJIFILM CORPORATION (JP) 2012-08-16 US disclosed
US-20120003467-A1 Antistatic laminate, optical film, polarizing plate, image display device and production method of antistatic laminate FUJI FILM CORPORATION (JP) 2012-01-05 US disclosed
US-20110026126-A1 Antireflection film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20110026121-A1 Laminate, antireflective film, polarizing plate and image display device FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
EP-0820980-B1 FLUORINATED POLYFUNCTIONAL (METH)ACRYLIC ESTERS, FLUOROMONOMER COMPOSITION, MATERIAL WITH LOW REFRACTIVE INDEX, AND LOWLY REFLECTIVE FILM NOF CORP (JP) 2001-07-11 EP disclosed
US-6254973-B1 WEAR RESISTANCE NOF CORPORATION (JP) 2001-07-03 US disclosed
EP-0820980-A1 FLUORINATED POLYFUNCTIONAL (METH)ACRYLIC ESTERS, FLUOROMONOMER COMPOSITION, MATERIAL WITH LOW REFRACTIVE INDEX, AND LOWLY REFLECTIVE FILM NOF CORPORATION (JP) 1998-01-28 EP disclosed