SCHEMBL249444

SCHEMBL249444

CC(=COC1CC(C)(C)NC(C)(C)C1)C(=O)O

nearest known ligand 0.43

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.43
ALOX15 P16050 1/20 0.32
EZH2 Q15910 2/20 0.31
TSHR P16473 1/20 0.31
POLB P06746 1/20 0.31
ALDH1A1 P00352 1/20 0.31
ATM Q13315 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
HTT P42858 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6902521 1.00 GAA (0.43) GAAALOX15EZH2TSHRPOLB
SCHEMBL5545555 0.85 GAA (0.39) GAAALDH1A1
SCHEMBL5545558 0.85 GAA (0.39) GAAALDH1A1
SCHEMBL5549612 0.80
SCHEMBL208073 0.77 GAA (0.36) GAAALOX15EZH2TSHRPOLB
SCHEMBL197543 0.77 GAA (0.36) GAAALOX15EZH2TSHRPOLB
SCHEMBL11527860 0.74 GAA (0.44) GAAALOX15EZH2TSHRPOLB
SCHEMBL5551605 0.74 GAA (0.44) GAAALOX15EZH2TSHRPOLB
SCHEMBL27006699 0.74 GAA (0.34) GAAALOX15EZH2POLBALDH1A1
SCHEMBL15880774 0.73 TSHR (0.34) GAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2008104683-A1 ELECTRODE CONTAINING AT LEAST ONE NITROXIDE AND CARBON NANOTUBES ARKEMA FRANCE (FR) 2008-09-04 WO claimed
US-7262250-B2 Scorch-retardant composition ARKEMA FRANCE (FR) 2007-08-28 US claimed
EP-1322701-B1 SCORCH-DELAYING COMPOSITION ATOFINA (FR) 2004-11-24 EP claimed
US-20040198920-A1 Scorch-retardant composition ATOFINA 2004-10-07 US claimed
US-9356292-B2 Radical composition and battery using same SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2016-05-31 US disclosed
US-20140061532-A1 RADICAL COMPOSITION AND BATTERY USING SAME WASEDA UNIVERSITY (JP) 2014-03-06 US disclosed
EP-1752474-B1 METHOD FOR PRODUCING CROSSLINKED POLY(METH)ACRYLATE COMPOUND SUMITOMO SEIKA CHEMICALS (JP) 2013-06-12 EP disclosed
US-8088874-B2 Crosslinked (meth)acrylic acid copolymer and secondary-cell electrode employing the same SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2012-01-03 US disclosed
EP-2042523-B1 CROSSLINKED (METH)ACRYLIC ACID COPOLYMER AND SECONDARY-CELL ELECTRODE EMPLOYING THE SAME SUMITOMO SEIKA CHEMICALS (JP) 2011-04-13 EP disclosed
US-7816457-B2 Method for producing crosslinked poly(meth)acrylate compound SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2010-10-19 US disclosed
US-20090306304-A1 CROSSLINKED (METH)ACRYLIC ACID COPOLYMER AND SECONDARY-CELL ELECTRODE EMPLOYING THE SAME SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2009-12-10 US disclosed
EP-2042523-A1 CROSSLINKED (METH)ACRYLIC ACID COPOLYMER AND SECONDARY-CELL ELECTRODE EMPLOYING THE SAME SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2009-04-01 EP disclosed
US-20080319149-A1 Method for Producing Crosslinked Poly (Meth) Acrylate Compound SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2008-12-25 US disclosed
WO-2008104683-A1 ELECTRODE CONTAINING AT LEAST ONE NITROXIDE AND CARBON NANOTUBES ARKEMA FRANCE (FR) 2008-09-04 WO disclosed
US-7262250-B2 Scorch-retardant composition ARKEMA FRANCE (FR) 2007-08-28 US disclosed
US-20050192419-A1 Scorch-retardant composition ARKEMA FRANCE (FR) 2005-09-01 US disclosed
US-20040198920-A1 Scorch-retardant composition ATOFINA 2004-10-07 US disclosed