SCHEMBL2497895

SCHEMBL2497895

CCOC(=O)c1ccc(C2=NC(c3c(Cl)cc(Cl)cc3Cl)(C3(c4c(Cl)cc(Cl)cc4Cl)N=C(c4ccc(C(=O)OCC)cc4)C(c4ccc(C(=O)OCC)cc4)=N3)N=C2c2ccc(C(=O)OCC)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.51
MAPT P10636 2/20 0.51
NPC1 O15118 1/20 0.51
POLB P06746 1/20 0.51
TSHR P16473 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
HSD17B10 Q99714 1/20 0.51
TRPV1 Q8NER1 1/20 0.44
SIRT2 Q8IXJ6 1/20 0.44
SIRT1 Q96EB6 1/20 0.44
SIRT3 Q9NTG7 1/20 0.44
PDK2 Q15119 1/20 0.43
CA12 O43570 2/20 0.43
CA1 P00915 2/20 0.43
CA2 P00918 2/20 0.43
CA7 P43166 2/20 0.43
CA9 Q16790 2/20 0.43
CA14 Q9ULX7 2/20 0.43
ESR1 P03372 1/20 0.43
ESR2 Q92731 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8666424 0.86 RHEB (0.44) RAB9AMAPTNPC1SMN1; SMN2CA12
SCHEMBL2494927 0.85 MAPT (0.55) RAB9AMAPTNPC1POLBTSHR
SCHEMBL1472033 0.80 PDK2 (0.48) RAB9AMAPTNPC1POLBTSHR
SCHEMBL1061886 0.78 MAPT (0.43) RAB9AMAPTNPC1POLBTSHR
SCHEMBL2492236 0.74 PDK2 (0.47) RAB9AMAPTNPC1SMN1; SMN2PDK2
SCHEMBL8427318 0.73 PDK2 (0.46) RAB9AMAPTNPC1TSHRSMN1; SMN2
SCHEMBL7480159 0.73 CA12 (0.61) RAB9AMAPTNPC1POLBTSHR
SCHEMBL8427292 0.72 PDK2 (0.46) RAB9AMAPTNPC1SMN1; SMN2PDK2
SCHEMBL2496668 0.72 PDK2 (0.50) RAB9AMAPTNPC1TSHRSMN1; SMN2
SCHEMBL8665403 0.72 MAPT (0.48) RAB9AMAPTNPC1SMN1; SMN2PDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9068082-B2 Colored curable composition and color filter FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20150108086-A1 COLORED CURABLE COMPOSITION AND COLOR FILTER FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-5866298-A Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-02-02 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
EP-0775941-A1 Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-05-28 EP disclosed