SCHEMBL2498617

SCHEMBL2498617

O=[C]C1CCCC(=O)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14843764 0.85
SCHEMBL14787054 0.79
SCHEMBL1578217 0.79
SCHEMBL9769345 0.73
SCHEMBL10413572 0.73 TRIM24 (0.38)
SCHEMBL17260770 0.71 TRIM24 (0.40)
SCHEMBL17260789 0.71 TRIM24 (0.40)
SCHEMBL11239081 0.70
SCHEMBL14441603 0.69 TRIM24 (0.42)
SCHEMBL14842917 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8030644-B2 Organic insulator composition, organic insulating film having the same, organic thin film transistor having the same and electronic device having the same and methods of forming the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-10-04 US claimed
US-7645556-B2 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-01-12 US claimed
EP-1730773-B1 POLYMERS OF POLYCYCLIC OLEFINS HAVING A POLYHEDRAL OLIGOSILSESQUIOXANE PENDANT GROUP AND USES THEREOF PROMERUS LLC (US) 2008-09-24 EP claimed
US-20070129473-A1 Organic insulator composition, organic insulating film having the same, organic thin film transistor having the same and electronic device having the same and methods of forming the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-06-07 US claimed
US-20060006380-A1 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-01-12 US claimed
US-20050279995-A1 Composition for preparing organic insulating film and organic insulating film prepared from the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-12-22 US claimed
US-7645556-B2 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-01-12 US disclosed
US-20060006380-A1 Composition for forming organic insulating film and method for forming pattern of organic insulating film using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-01-12 US disclosed
US-20050279995-A1 Composition for preparing organic insulating film and organic insulating film prepared from the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-12-22 US disclosed
US-6762268-B2 RADIATION TRANSPARENT, SENSITIVITY, CHEMICAL RESISTANCE SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-07-13 US disclosed
US-20030004289-A1 Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same SAMSUNG ELECTRONICS CO., LTD. 2003-01-02 US disclosed
CN-1290275-A Catalyst and process for polymerization of cycloolefin GOODRICH CO B F (US) 2001-04-04 CN disclosed