SCHEMBL250071

SCHEMBL250071

Oc1nccnc1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13094522 0.76 KDM4E (0.31)
SCHEMBL28290408 0.75
SCHEMBL1562696 0.75
SCHEMBL4988940 0.75
SCHEMBL9779712 0.75
SCHEMBL9037857 0.75
SCHEMBL6774384 0.75
SCHEMBL4778213 0.73
SCHEMBL11327091 0.71
SCHEMBL29957535 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 435 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115109249-B Cationic-nonionic hydrophilic monomer, and preparation method and application thereof 浙江传化功能新材料有限公司 2024-07-09 CN claimed
CN-116217448-B Preparation method of isocyanate crosslinking agent containing double quaternary ammonium cations and double sulfobetaines 江苏海洋大学 2023-11-17 CN claimed
CN-116574297-A Modification method of functional isocyanate crosslinking agent on polyurethane material surface 江苏海洋大学 2023-08-11 CN claimed
CN-116478439-A Application of functional isocyanate crosslinking agent in surface modification of polyvinyl chloride material 江苏海洋大学 2023-07-25 CN claimed
CN-116217448-A Preparation method of isocyanate crosslinking agent containing double quaternary ammonium cations and double sulfobetaines 江苏海洋大学 2023-06-06 CN claimed
CN-109725490-B Photosensitive resin composition, dry film, cured product, semiconductor element, printed circuit board and electronic component 太阳控股株式会社 2023-06-06 CN claimed
CN-115047715-A Positive photosensitive polybenzoxazole resin composition, preparation method and application thereof 南通晶爱微电子科技有限公司 2022-09-13 CN claimed
EP-3919541-A1 EPOXY RESIN SOLUTION Unitika Ltd. (JP) 2021-12-08 EP claimed
WO-2020158493-A1 EPOXY RESIN SOLUTION ユニチカ株式会社 2020-08-06 WO claimed
US-20180129134-A1 PRODUCTION PROCESS FOR SOLDER ELECTRODE AND USE THEREOF JSR CORPORATION (JP) 2018-05-10 US claimed
WO-2007006636-A2 PIGMENT DISPERSIONS WITH POLYMERIC DISPERSANTS HAVING PENDING CHROMOPHORE GROUPS. AGFA GRAPHICS NV (BE) 2007-01-18 WO claimed
WO-2007006639-A2 PIGMENT DISPERSIONS WITH POLYMERIC DISPERSANTS HAVING PENDING CHROMOPHORE GROUPS AGFA GRAPHICS NV (BE) 2007-01-18 WO claimed
WO-2007006637-A2 PIGMENT DISPERSIONS WITH POLYMERIC DISPERSANTS HAVING PENDING CHROMOPHORE GROUPS. AGFA GRAPHICS NV (BE) 2007-01-18 WO claimed
WO-2007006635-A2 PIGMENT DISPERSIONS WITH POYMERIC DISPERSANTS HAVING PENDING CHROMOPHORE GROUPS AGFA GRAPHICS NV (BE) 2007-01-18 WO claimed
EP-0459395-B1 Positive photo-sensitive resin composition SUMITOMO BAKELITE CO (JP) 1999-08-18 EP claimed
US-5583186-A Process for the production of polybutene amines FERRO CORPORATION (US) 1996-12-10 US claimed
US-5449584-A Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound SUMITOMO BAKELITE COMPANY, LTD. (JP) 1995-09-12 US claimed
EP-0639589-A1 Process for the production of fuel additives from chlorinated polybutenes FERRO CORPORATION (US) 1995-02-22 EP claimed
US-5346965-A Process for the production of fuel additives from chlorinated polybutenes FERRO CORPORATION (US) 1994-09-13 US claimed
EP-0459395-A2 Positive photo-sensitive resin composition SUMITOMO BAKELITE COMPANY LIMITED (JP) 1991-12-04 EP claimed