SCHEMBL251016

SCHEMBL251016

CC1(F)C(F)=C(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10527933 0.80
SCHEMBL24614168 0.80
SCHEMBL27617267 0.76
SCHEMBL333168 0.71
SCHEMBL3834726 0.68
SCHEMBL27265828 0.67
SCHEMBL9755516 0.65
SCHEMBL274532 0.65
SCHEMBL332651 0.65
SCHEMBL28113164 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8399723-B2 Processes for production and purification of hydrofluoroolefins E I DU PONT DE NEMOURS AND COMPANY (US) 2013-03-19 US disclosed
US-20120004475-A1 PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2012-01-05 US disclosed
US-20110118512-A1 PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS E.I. DU PONT DE NEMOURS AND COMPANY (US) 2011-05-19 US disclosed
US-7897823-B2 Process for production of azeotrope compositions comprising hydrofluoroolefin and hydrogen fluoride and uses of said azeotrope compositions in separation processes E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-03-01 US disclosed
EP-1960336-A1 PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS E.I. DU PONT DE NEMOURS AND COMPANY (US) 2008-08-27 EP disclosed
WO-2007053178-A1 PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2007-05-10 WO disclosed
US-20060106263-A1 Processes for production and purification of hydrofluoroolefins THE CHEMOURS COMPANY FC, LLC 2006-05-18 US disclosed
US-6383403-B1 USING OCTAFLUOROCYCLOPENTENE AND GENERATING A PLASMA USING INDUCTION OR HELICON WAVE SYSTEM TO ETCH SEMICONDUCTORS; HIGH ETCH SELECTIVITY; DOESN'T FORM POLYMER JAPAN AS REPRESENTED BY THE DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2002-05-07 US disclosed
EP-0964438-A1 DRY ETCHING METHOD Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1999-12-15 EP disclosed
EP-0948033-A1 GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1999-10-06 EP disclosed