⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11256570 | 0.96 | — | — | |
| SCHEMBL34902 | 0.84 | — | — | |
| SCHEMBL18406262 | 0.83 | — | — | |
| SCHEMBL26034981 | 0.81 | — | — | |
| SCHEMBL2531649 | 0.80 | — | — | |
| SCHEMBL26106889 | 0.80 | — | — | |
| SCHEMBL29518737 | 0.78 | — | — | |
| SCHEMBL17522115 | 0.78 | — | — | |
| SCHEMBL16021808 | 0.76 | — | — | |
| SCHEMBL938341 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11753307-B2 | Modified zeolites that include hafnium-containing organometallic moieties and methods for making such | SAUDI ARABIAN OIL COMPANY (SA) | 2023-09-12 | — | — | US | disclosed |
| US-11731882-B2 | Modified zeolites that include titanium-containing organometallic moieties and methods for making such | SAUDI ARABIAN OIL COMPANY (SA) | 2023-08-22 | — | — | US | disclosed |
| US-11731881-B2 | Modified zeolites that include zirconium-containing organometallic moieties and methods for making such | SAUDI ARABIAN OIL COMPANY (SA) | 2023-08-22 | — | — | US | disclosed |
| US-8034545-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2011-10-11 | — | — | US | disclosed |
| US-20090220897-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL CO., LTD. (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090214796-A1 | Method for Forming Antireflection Film | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2009-08-27 | — | — | US | disclosed |
| US-20080260956-A1 | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part | HITACHI CHEMICAL CO., LTD. (JP) | 2008-10-23 | — | — | US | disclosed |
| EP-1890172-A1 | METHOD FOR FORMING ANTIREFLECTION FILM | Hitachi Chemical Co., Ltd. (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-7297464-B2 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2007-11-20 | — | — | US | disclosed |
| EP-1829945-A1 | FILM, SILICA FILM AND METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING SILICA FILM, AND ELECTRONIC PART | Hitachi Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1672427-A1 | RADIATION-CURING COMPOSITION, METHOD FOR STORING SAME, METHOD FOR FORMING CURED FILM, METHOD FOR FORMING PATTERN, METHOD FOR USING PATTERN, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE | Hitachi Chemical Co., Ltd. (JP) | 2006-06-21 | — | — | EP | disclosed |
| EP-1672426-A1 | RADIATION CURABLE COMPOSITION, STORING METHOD THEREOF, FORMING METHOD OF CURED FILM, PATTERNING METHOD, USE OF PATTERN, ELECTRONIC COMPONENTS AND OPTICAL WAVEGUIDE | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-20050266344-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050239953-A1 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide | HITACHI CHEMICAL CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-1167406-B1 | High energy radiation-curable composition and resin molding | DOW CORNING TORAY SILICONE (JP) | 2005-01-12 | — | — | EP | disclosed |
| US-6515041-B2 | A partial hydrolysis-condensation product of (A) a mixture of an alkoxy containig organopolysiloxane and alkoxysilanes and (B) a multifunctional acrylate; superior curability, waterproofing, oil repellency, flexibility and transparancy | DOW CORNING TORAY SILICONE CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20020016380-A1 | High energy radiation-curable composition and resin molding | DOW CORNING TORAY SILICONE COMPANY, LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| EP-1167406-A1 | High energy radiation-curable composition and resin molding | Dow Corning Toray Silicone Co., Ltd. (JP) | 2002-01-02 | — | — | EP | disclosed |
| US-6103942-A | SUITABLE FOR FORMING THIN LAYER SILICON STRUCTURES IN VARIOUS SEMICONDUCTOR DEVICES AND HIGH PURITY POLY- AND SINGLE CRYSTAL SILICON FOR A VARIETY OF APPLICATIONS; REACTION OF METALLURGICAL SILICON WITH ALCOHOL IN PRESENCE OF CATALYST | MIDWEST RESEARCH INSTITUTE (US) | 2000-08-15 | — | — | US | disclosed |
| US-3957683-A | Paste-like mixtures containing a cross-linking agent and a condensation catalyst | WACKER-CHEMIE GMBH (DT) | 1976-05-18 | — | — | US | disclosed |