⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL252202 | 0.93 | — | — | |
| SCHEMBL250879 | 0.86 | — | — | |
| SCHEMBL251897 | 0.85 | — | — | |
| SCHEMBL1531420 | 0.83 | — | — | |
| SCHEMBL2484954 | 0.79 | — | — | |
| SCHEMBL2671434 | 0.79 | — | — | |
| SCHEMBL8211937 | 0.77 | — | — | |
| SCHEMBL1250977 | 0.76 | — | — | |
| SCHEMBL251331 | 0.75 | — | — | |
| SCHEMBL15128939 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11767410-B2 | Fluorinated copolymer composition and metal rubber laminate | AGC Inc. (JP) | 2023-09-26 | — | — | US | disclosed |
| CN-111194333-B | Fluorine-containing copolymer composition and metal rubber laminate | ＡＧＣ株式会社 | 2022-04-05 | — | — | CN | disclosed |
| CN-113646362-A | Fluorine-containing elastic copolymer composition, fluororubber, and method for producing same | ＡＧＣ株式会社 | 2021-11-12 | — | — | CN | disclosed |
| WO-2020204082-A1 | FLUORINE-CONTAINING ELASTIC COPOLYMER COMPOSITION, FLUORORUBBER, AND METHODS FOR PRODUCING THESE | ＡＧＣ株式会社 | 2020-10-08 | — | — | WO | disclosed |
| EP-3693411-A1 | FLUORINE-CONTAINING COPOLYMER COMPOSITION AND METAL-RUBBER LAYERED BODY | AGC Inc. (JP) | 2020-08-12 | — | — | EP | disclosed |
| US-20200216636-A1 | FLUORINATED COPOLYMER COMPOSITION AND METAL RUBBER LAMINATE | AGC Inc. (JP) | 2020-07-09 | — | — | US | disclosed |
| CN-111194333-A | Fluorine-containing copolymer composition and metal rubber laminate | ＡＧＣ株式会社 | 2020-05-22 | — | — | CN | disclosed |
| US-8547011-B2 | Layered product, luminescence device and use thereof | ZEON CORPORATION (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8399723-B2 | Processes for production and purification of hydrofluoroolefins | E I DU PONT DE NEMOURS AND COMPANY (US) | 2013-03-19 | — | — | US | disclosed |
| EP-1745922-B1 | MULTILAYER BODY, LIGHT-EMITTING DEVICE AND USE THEREOF | ZEON CORP (JP) | 2012-08-29 | — | — | EP | disclosed |
| US-20080018230-A1 | Layered Product, Luminescence Device and Use Thereof | ZEON CORPORATION (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20070282142-A1 | Gas Production Facility, Gas Supply Container, And Gas For Manufacture Of Electronic Devices | ZEON CORPORATION (JP) | 2007-12-06 | — | — | US | disclosed |
| EP-1830219-A1 | OPTICAL DEVICE | ZEON CORPORATION (JP) | 2007-09-05 | — | — | EP | disclosed |
| WO-2007053178-A1 | PROCESSES FOR PRODUCTION AND PURIFICATION OF HYDROFLUOROOLEFINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-10 | — | — | WO | disclosed |
| US-20070020951-A1 | Fluorocarbon film and method for forming same | ZEON CORPORATION (JP) | 2007-01-25 | — | — | US | disclosed |
| EP-1745922-A1 | MULTILAYER BODY, LIGHT-EMITTING DEVICE AND USE THEREOF | ZEON CORPORATION (JP) | 2007-01-24 | — | — | EP | disclosed |
| EP-1744092-A1 | APPARATUS FOR PRODUCING GAS, VESSEL FOR SUPPLYING GAS AND GAS FOR USE IN MANUFACTURING ELECTRONIC DEVICE | OHMI, Tadahiro (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-20060264059-A1 | Semiconductor device, method for manufacturing semiconductor device and gas for plasma cvd | ZEON CORPORATION (JP) | 2006-11-23 | — | — | US | disclosed |
| US-20060106263-A1 | Processes for production and purification of hydrofluoroolefins | THE CHEMOURS COMPANY FC, LLC | 2006-05-18 | — | — | US | disclosed |
| EP-1655772-A1 | SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND GAS FOR PLASMA CVD | TOKYO ELECTRON LIMITED (JP) | 2006-05-10 | — | — | EP | disclosed |