SCHEMBL25216293

SCHEMBL25216293

CCCCCCCCCCCCCCCCN(CCC(=O)O)CCC(=O)O

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM5A P29375 5/20 0.69
PHF8 Q9UPP1 3/20 0.69
KDM4C Q9H3R0 3/20 0.69
GPR84 Q9NQS5 7/20 0.60
PPARG P37231 7/20 0.60
PPARD Q03181 7/20 0.60
PPARA Q07869 7/20 0.60
HDAC11 Q96DB2 5/20 0.60
TSHR P16473 4/20 0.60
PTPN1 P18031 3/20 0.60
ALDH1A1 P00352 2/20 0.60
TLR2 O60603 2/20 0.60
TDP1 Q9NUW8 2/20 0.60
FABP4 P15090 2/20 0.60
SLC22A6 Q4U2R8 1/20 0.60
SLC22A8 Q8TCC7 1/20 0.60
MEN1 O00255 1/20 0.60
ESR1 P03372 1/20 0.60
ALOX15 P16050 1/20 0.60
PDE4A P27815 1/20 0.60

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7565249 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL18954288 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL10352073 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL10631075 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL25266744 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL19821301 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL11680438 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL25211928 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL11587025 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG
SCHEMBL10352453 1.00 KDM5A (0.69) KDM5APHF8KDM4CGPR84PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023085008-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, PRODUCTION METHOD THEREFOR, AND POLISHING METHOD JSR株式会社 2023-05-19 WO disclosed
WO-2023085007-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION AND POLISHING METHOD JSR株式会社 2023-05-19 WO disclosed
WO-2023085009-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION AND POLISHING METHOD JSR株式会社 2023-05-19 WO disclosed