SCHEMBL2523938

SCHEMBL2523938

[CH2]c1cccc(O)c1[CH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4178557 0.84
SCHEMBL7990103 0.78
SCHEMBL547602 0.77
SCHEMBL29432214 0.75
SCHEMBL26070 0.75
SCHEMBL10763167 0.72
SCHEMBL11182374 0.72
SCHEMBL19474739 0.72
SCHEMBL7835450 0.72 IDO1 (0.52)
SCHEMBL1306181 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024080369-A1 PILLARARENE COMPLEX ダイキン工業株式会社 2024-04-18 WO disclosed
WO-2024080376-A1 PILLARARENE COMPLEX ダイキン工業株式会社 2024-04-18 WO disclosed
WO-2024038833-A1 FLUORINE-CONTAINING AROMATIC POLYMER AND METHOD FOR PRODUCING FLUORINE-CONTAINING AROMATIC POLYMER 国立大学法人お茶の水女子大学 2024-02-22 WO disclosed
EP-2618216-B1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT HITACHI CHEMICAL CO LTD (JP) 2019-05-29 EP disclosed
US-9786576-B2 Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device HITACHI CHEMICAL COMPANY, LTD (JP) 2017-10-10 US disclosed
US-9395626-B2 Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-07-19 US disclosed
US-20140322635-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND ELECTRONIC COMPONENT HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-10-30 US disclosed
EP-2793082-A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING PATTERNED CURED FILM, AND ELECTRONIC COMPONENT Hitachi Chemical Company, Ltd. (JP) 2014-10-22 EP disclosed
US-8836089-B2 Positive photosensitive resin composition, method of creating resist pattern, and electronic component HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-09-16 US disclosed
EP-2221666-B1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCTION OF RESIST PATTERN, AND SEMICONDUCTOR DEVICE HITACHI CHEMICAL CO LTD (JP) 2013-09-18 EP disclosed
US-20030119887-A1 Lactacystin analogs SCHREIBER STUART L (US) 2003-06-26 US disclosed
US-6458825-B1 EUKARYOTIC CELLS CONTAIN MULTIPLE PROTEOLYTIC SYSTEMS, INCLUDING LYSOSOMAL PROTEASES, CALPAINS, ATP-UBIQUITIN-PROTEASOME DEPENDENT PATHWAY, AND AN PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2002-10-01 US disclosed
US-6335358-B1 PROTEASOME INHIBITORS; ALZHEIMER*S DISEASE, CACHEXIA, AND MUSCLE WASTING TREATMENT PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2002-01-01 US disclosed
US-6214862-B1 ANALYZING PROTEASOME SENSITIVITY PROTEOLYSIS PRESIDENT AND FELLOWS OF HARVARD COLLEGE 2001-04-10 US disclosed
WO-2001000707-A1 LIGHT DIFFUSING BLOCK COPOLYCARBONATES BAYER AKTIENGESELLSCHAFT (DE) 2001-01-04 WO disclosed
US-6147223-A Lactacystin analogs PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2000-11-14 US disclosed
EP-0820283-A4 LACTACYSTIN ANALOGS HARVARD COLLEGE (US) 1998-07-08 EP disclosed
US-5756764-A DRUG; PROTEASOME INHIBITORS PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 1998-05-26 US disclosed
EP-0820283-A1 LACTACYSTIN ANALOGS THE PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 1998-01-28 EP disclosed
WO-1996032105-A1 LACTACYSTIN ANALOGS PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 1996-10-17 WO disclosed