⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28141046 | 0.98 | — | — | |
| SCHEMBL948033 | 0.85 | — | — | |
| SCHEMBL9395446 | 0.83 | TSHR (0.48) | — | |
| Ammonia Solution, Strong SCHEMBL9782552 | 0.83 | TSHR (0.48) | — | |
| SCHEMBL9395434 | 0.83 | TSHR (0.48) | — | |
| SCHEMBL8541464 | 0.82 | TSHR (0.44) | — | |
| SCHEMBL7059953 | 0.81 | — | — | |
| SCHEMBL8913642 | 0.79 | — | — | |
| SCHEMBL7594167 | 0.79 | — | — | |
| SCHEMBL7219660 | 0.77 | CYP3A4 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 544 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160122311-A1 | SYNTHESIS OF COUMALIC ACID | IOWA STATE UNIVERSITY RESEARCH FOUNDATION, INC. | 2016-05-05 | — | — | US | claimed |
| US-6270939-B1 | STORAGE STABILITY AND SUITED FOR USE AS A RESIST FOR MAKING INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-08-07 | — | — | US | claimed |
| EP-0211667-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-03-11 | — | — | EP | claimed |
| EP-0457367-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-11-21 | — | — | EP | claimed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | claimed |
| US-4558126-A | Method of preparing uracil | DYNAMIT NOBEL AG (DE) | 1985-12-10 | — | — | US | claimed |
| US-4526975-A | 2-Amino-4-(4-pyridinyl)benzoic acids | ETHYL CORPORATION (US) | 1985-07-02 | — | — | US | claimed |
| US-4515984-A | Process for the preparation of alkali-metal formyl acid esters | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1985-05-07 | — | — | US | claimed |
| EP-0031044-B1 | PROCESS FOR PREPARING ALKALINE FORMYL ACETIC ACID ESTERS | HÜLS TROISDORF AKTIENGESELLSCHAFT (DE) | 1983-10-05 | — | — | EP | claimed |
| CN-107801394-B | Fat-soluble compound, photosensitive resin composition and color filter | 三星SDI株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-113946102-B | Photosensitive resin composition, photosensitive resin film using same, and color filter | 三星SDI株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-115572492-B | Core-shell compound, photosensitive resin composition, photosensitive resin layer, color filter and CMOS image sensor | 三星SDI株式会社 | 2024-07-09 | — | — | CN | disclosed |
| WO-2024144281-A1 | PIXEL DEFINITION LAYER MANUFACTURING METHOD | 덕산네오룩스 주식회사 | 2024-07-04 | — | — | WO | disclosed |
| WO-2024143778-A1 | COMPOUND, ADHESIVE COMPOSITION COMPRISING SAME, ADHESIVE FILM, AND ELECTRONIC DEVICE | 주식회사 엘지화학 | 2024-07-04 | — | — | WO | disclosed |
| EP-0211667-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-02-25 | — | — | EP | disclosed |
| US-4558126-A | Method of preparing uracil | DYNAMIT NOBEL AG (DE) | 1985-12-10 | — | — | US | disclosed |
| US-4558126-A | Method of preparing uracil | DYNAMIT NOBEL AG (DE) | 1985-12-10 | — | — | US | disclosed |
| US-4515984-A | Process for the preparation of alkali-metal formyl acid esters | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1985-05-07 | — | — | US | disclosed |
| US-4515984-A | Process for the preparation of alkali-metal formyl acid esters | DYNAMIT NOBEL AKTIENGESELLSCHAFT (DE) | 1985-05-07 | — | — | US | disclosed |
| US-4476306-A | Method of preparing 2,4-dihydroxypyrimidine | DYNAMIT NOBEL AG (DE) | 1984-10-09 | — | — | US | disclosed |