SCHEMBL2536723

SCHEMBL2536723

COC(=O)CC(O)C(C)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.43
HSD17B10 Q99714 1/20 0.40
MGAM O43451 1/20 0.40
GAA P10253 1/20 0.40
SI P14410 1/20 0.40
MGAM2 Q2M2H8 1/20 0.40
ABCB1 P08183 1/20 0.39
CYP2D6 P10635 1/20 0.38
MAPT P10636 1/20 0.36
RAB9A P51151 1/20 0.36
REN P00797 4/20 0.35
CA12 O43570 2/20 0.33
CA14 Q9ULX7 2/20 0.33
TET2 Q6N021 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
CA7 P43166 1/20 0.33
CA9 Q16790 1/20 0.33
KCNA5 P22460 1/20 0.33
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL28006948 0.98 TSHR (0.42) TSHRHSD17B10MGAMGAASI
SCHEMBL5576930 0.87 TSHR (0.50) TSHRHSD17B10MGAMGAASI
SCHEMBL7378346 0.85 TSHR (0.43) TSHRHSD17B10MGAMGAASI
SCHEMBL9078516 0.85 TSHR (0.43) TSHRHSD17B10MGAMGAASI
SCHEMBL13305751 0.81 TSHR (0.40) TSHRHSD17B10MGAMGAASI
SCHEMBL9153932 0.80 TSHR (0.43) TSHRHSD17B10MGAMGAASI
SCHEMBL4298984 0.79 ABCB1 (0.39) TSHRHSD17B10MGAMGAASI
Hydrochloric Acid SCHEMBL15209909 0.79 TSHR (0.39) TSHRHSD17B10MGAMGAASI
Hydrochloric Acid SCHEMBL15209911 0.79 TSHR (0.39) TSHRHSD17B10MGAMGAASI
SCHEMBL55045 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050164127-A1 Method for removing a sacrificial material with a compressed fluid REFLECTIVITY, INC. 2005-07-28 US claimed
CN-109415513-B Silicon-rich silsesquioxane resins 美国陶氏有机硅公司 2022-02-25 CN disclosed
CN-109071576-B Silsesquioxane resin and an oxaamine composition 美国陶氏有机硅公司 2021-12-28 CN disclosed
CN-108257854-B Method for manufacturing graphical mask 苏州太阳井新能源有限公司 2020-09-11 CN disclosed
US-9695269-B2 Preparation of polyurethanes and polyesters from glycolipid type compounds UNIVERSITÉ DE BORDEAUX (FR) 2017-07-04 US disclosed
US-20140235814-A1 PREPARATION OF POLYURETHANES AND POLYESTERS FROM GLYCOLIPID TYPE COMPOUNDS INSTITUT DES CORPS GRAS ETUDES ET RECHERCHES TECHNIQUES - ITERG (FR) 2014-08-21 US disclosed
US-20110256813-A1 COATED CARRIER FOR LAPPING AND METHODS OF MAKING AND USING 3M INNOVATIVE PROPERTIES COMPANY 2011-10-20 US disclosed
US-20060093732-A1 Ink-jet printing of coupling agents for trace or circuit deposition templating HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. 2006-05-04 US disclosed
US-6958123-B2 Method for removing a sacrificial material with a compressed fluid REFLECTIVITY, INC (US) 2005-10-25 US disclosed
US-20050164127-A1 Method for removing a sacrificial material with a compressed fluid REFLECTIVITY, INC. 2005-07-28 US disclosed
US-20030047533-A1 Method for removing a sacrificial material with a compressed fluid REFLECTIVITY, INC., A CALIFORNIA CORPORATION 2003-03-13 US disclosed