⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9064721 | 0.82 | — | — | |
| SCHEMBL8760701 | 0.80 | — | — | |
| SCHEMBL471900 | 0.79 | — | — | |
| SCHEMBL21724490 | 0.78 | — | — | |
| SCHEMBL28077508 | 0.78 | — | — | |
| SCHEMBL27389221 | 0.78 | — | — | |
| SCHEMBL28312353 | 0.78 | — | — | |
| SCHEMBL9706871 | 0.77 | — | — | |
| SCHEMBL8937706 | 0.76 | — | — | |
| SCHEMBL867074 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117229478-A | High-low temperature resistant epoxy resin and synthetic method and application thereof | 辽宁师范大学 | 2023-12-15 | — | — | CN | claimed |
| CN-117229478-A | High-low temperature resistant epoxy resin and synthetic method and application thereof | 辽宁师范大学 | 2023-12-15 | — | — | CN | disclosed |
| CN-113072685-B | Liquefied aromatic amine curing agent composition and preparation method thereof, epoxy resin composition and application | 万华化学集团股份有限公司 | 2022-04-19 | — | — | CN | disclosed |
| CN-113072685-B | Liquefied aromatic amine curing agent composition and preparation method thereof, epoxy resin composition and application | 万华化学集团股份有限公司 | 2022-04-19 | — | — | CN | disclosed |
| CN-113072685-A | Liquefied aromatic amine curing agent composition and preparation method thereof, epoxy resin composition and application | 万华化学集团股份有限公司 | 2021-07-06 | — | — | CN | disclosed |
| EP-2742086-A1 | METHOD FOR PREPARING (HYDROXYMETHYL)POLYSILOXANES | Wacker Chemie AG (DE) | 2014-06-18 | — | — | EP | disclosed |
| US-8497058-B2 | Image forming method and method of recycling image forming material | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2013-07-30 | — | — | US | disclosed |
| WO-2013023863-A1 | METHOD FOR PREPARING (HYDROXYMETHYL)POLYSILOXANES | WACKER CHEMIE AG (DE) | 2013-02-21 | — | — | WO | disclosed |
| CN-101155856-B | Templated metal particles in cross-linked dendrimers in nucleus and methods of making | 3M INNOVATIVE PROPERTIES CO | 2012-06-13 | — | — | CN | disclosed |
| US-20110254260-A1 | IMAGE PRINTED MATTER AND IMAGE FORMING METHOD | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2011-10-20 | — | — | US | disclosed |
| US-20100248130-A1 | IMAGE FORMING METHOD AND METHOD OF RECYCLING IMAGE FORMING MATERIAL | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2010-09-30 | — | — | US | disclosed |
| CN-101155856-A | Templated metal particles and methods of making | 3M INNOVATIVE PROPERTIES CO (US) | 2008-04-02 | — | — | CN | disclosed |