SCHEMBL25422141

SCHEMBL25422141

Oc1ccc(-c2cc(F)c(F)c(O)c2O)cc1O

nearest known ligand 0.50

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ APP P05067 3/20 0.50
▸ SNCA P37840 4/20 0.43
▸ MAPT P10636 3/20 0.43
▸ ALOX5 P09917 3/20 0.42
▸ QDPR P09417 3/20 0.40
▸ ADORA3 P0DMS8 1/20 0.39
▸ ADORA2A P29274 1/20 0.39
▸ ADORA1 P30542 1/20 0.39
▸ TERT O14746 1/20 0.39
▸ ESR1 P03372 1/20 0.39
▸ ESR2 Q92731 1/20 0.39
▸ MGAM O43451 1/20 0.38
▸ GAA P10253 1/20 0.38
▸ SI P14410 1/20 0.38
▸ MGAM2 Q2M2H8 1/20 0.38
▸ DYRK1A Q13627 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25419106 0.89 APP (0.50) APPSNCAMAPTALOX5QDPR
SCHEMBL25419909 0.81 APP (0.50) APPSNCAMAPTALOX5QDPR
SCHEMBL12963267 0.79 APP (0.64) APPSNCAMAPTALOX5QDPR
SCHEMBL25421467 0.78 APP (0.52) APPSNCAMAPTALOX5QDPR
SCHEMBL25423048 0.77 APP (0.50) APPSNCAMAPTALOX5QDPR
SCHEMBL25421391 0.77 APP (0.50) APPSNCAMAPTALOX5QDPR
SCHEMBL25422734 0.76 APP (0.54) APPSNCAMAPTALOX5QDPR
SCHEMBL25420746 0.74 APP (0.56) APPSNCAMAPTALOX5QDPR
SCHEMBL19187325 0.74 APP (0.61) APPMAPTALOX5QDPRESR1
SCHEMBL25423467 0.73 ESR1 (0.40) MAPTESR1ESR2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 — — US disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 — — EP disclosed
Send feedback