Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.36 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.34 |
| ▸ | ESR1 | P03372 | 4/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25420886 | 0.94 | IDO1 (0.35) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25421278 | 0.89 | TAAR1 (0.33) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25421334 | 0.88 | IDO1 (0.34) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25422240 | 0.88 | IDO1 (0.34) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25419103 | 0.87 | TAAR1 (0.34) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25419456 | 0.85 | TAAR1 (0.33) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25421837 | 0.83 | TAAR1 (0.34) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL25422851 | 0.76 | NQO1 (0.36) | IDO1TAAR1ESR1ESR2CA12 | |
| SCHEMBL29006491 | 0.75 | NQO1 (0.32) | ESR1ESR2CA12CA1CA9 | |
| SCHEMBL16982139 | 0.74 | ESR1 (0.37) | TAAR1ESR1ESR2CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240122065-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2024-04-11 | — | — | US | disclosed |
| EP-4198163-A1 | METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | Tosoh Corporation (JP) | 2023-06-21 | — | — | EP | disclosed |
| CN-116157382-A | Material for metal patterning, amine compound, electronic device, and method for forming metal pattern | 东曹株式会社 | 2023-05-23 | — | — | CN | disclosed |