SCHEMBL25476381

SCHEMBL25476381

BCc1cc(CB)c(CB)c(C(=O)OC2C3CC4C(CC(=O)C42)C3C(=O)OCCS(=O)(=O)O)c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25528193 0.85 — —
SCHEMBL25476382 0.84 — —
SCHEMBL25476384 0.80 — —
SCHEMBL25476390 0.79 — —
SCHEMBL25528212 0.77 — —
SCHEMBL25476383 0.77 — —
SCHEMBL25476380 0.77 — —
SCHEMBL25476350 0.75 — —
SCHEMBL25476360 0.74 — —
SCHEMBL25737069 0.74 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230161255-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 — — US disclosed
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