⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL7618503 | 0.67 | GAA (0.38) | — | |
| SCHEMBL507708 | 0.67 | — | — | |
| SCHEMBL10403596 | 0.65 | — | — | |
| SCHEMBL21516538 | 0.65 | — | — | |
| SCHEMBL18635503 | 0.65 | — | — | |
| SCHEMBL94304 | 0.65 | — | — | |
| Water SCHEMBL7540447 | 0.65 | — | — | |
| SCHEMBL1393843 | 0.63 | — | — | |
| SCHEMBL15404204 | 0.63 | — | — | |
| SCHEMBL8207759 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118234830-A | Selective wet etching composition and method | 恩特格里斯公司 | 2024-06-21 | — | — | CN | claimed |
| CN-109971359-B | Chemical mechanical polishing solution | 安集微电子（上海）有限公司 | 2021-12-07 | — | — | CN | claimed |
| CN-111378377-A | Chemical mechanical polishing solution and application thereof | 安集微电子（上海）有限公司 | 2020-07-07 | — | — | CN | claimed |
| CN-118234830-A | Selective wet etching composition and method | 恩特格里斯公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-109971359-B | Chemical mechanical polishing solution | 安集微电子（上海）有限公司 | 2021-12-07 | — | — | CN | disclosed |
| CN-111378377-A | Chemical mechanical polishing solution and application thereof | 安集微电子（上海）有限公司 | 2020-07-07 | — | — | CN | disclosed |
| US-20190085208-A1 | POLISHING COMPOSITION, METHOD FOR PRODUCING SAME, POLISHING METHOD, AND METHOD FOR PRODUCING SUBSTRATE | FUJIMI INCORPORATED (JP) | 2019-03-21 | — | — | US | disclosed |
| WO-2011122815-A2 | NOVEL QUINOXALINE DERIVATIVES | DONG-A PHARM.CO.,LTD. (KR) | 2011-10-06 | — | — | WO | disclosed |
| US-5438053-A | Antibacterial agents | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1995-08-01 | — | — | US | disclosed |
| EP-0579221-A1 | Cephem compounds, their production and use | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1994-01-19 | — | — | EP | disclosed |
| CN-1021910-C | LANKACIDIN DERIVATIVES AND PRODUCTION THEREOF | TAKEDA CHEMICAL INDUSTRIES LTD (JP) | 1993-08-25 | — | — | CN | disclosed |
| US-4758557-A | Cephalosporin derivatives and bactericides containing the same | MEIJI SEIKA KAISHA, LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| EP-0117109-B1 | NOVEL CEPHALOSPORIN COMPOUND AND A PROCESS FOR PREPARING SAME | Tanabe Seiyaku Co., Ltd. (JP) | 1987-11-19 | — | — | EP | disclosed |
| CN-86108176-A | Lankacidin derivatives and process for producing the same | — | 1987-10-21 | — | — | CN | disclosed |
| EP-0226896-A2 | Lankacidin derivatives and production thereof | Takeda Chemical Industries, Ltd. (JP) | 1987-07-01 | — | — | EP | disclosed |
| EP-0209751-A2 | Cephalosporin derivatives and bactericides containing the same | MEIJI SEIKA KAISHA LTD. (JP) | 1987-01-28 | — | — | EP | disclosed |
| US-4576938-A | Cephalosporin compound and process for preparing the same | TANABE SEIYAKU CO., LTD. (JP) | 1986-03-18 | — | — | US | disclosed |
| US-4547494-A | BACTERICIDES | TANABE SEIYAKU CO., LTD. (JP) | 1985-10-15 | — | — | US | disclosed |
| EP-0117109-A2 | Novel cephalosporin compound and a process for preparing same | Tanabe Seiyaku Co., Ltd. (JP) | 1984-08-29 | — | — | EP | disclosed |
| EP-0081971-A2 | Novel cephalosporin compound and process for preparing the same | Tanabe Seiyaku Co., Ltd. (JP) | 1983-06-22 | — | — | EP | disclosed |