⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17589677 | 1.00 | — | — | |
| SCHEMBL14870895 | 0.89 | — | — | |
| SCHEMBL11946900 | 0.86 | — | — | |
| SCHEMBL9916138 | 0.85 | — | — | |
| SCHEMBL12602374 | 0.85 | — | — | |
| SCHEMBL25457769 | 0.83 | BCHE (0.31) | — | |
| SCHEMBL17589675 | 0.83 | BCHE (0.31) | — | |
| SCHEMBL25526887 | 0.83 | — | — | |
| SCHEMBL9916146 | 0.83 | — | — | |
| SCHEMBL7010904 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152693-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230139896-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-04 | — | — | US | disclosed |