Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | HMGCR | P04035 | 1/20 | 0.41 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.41 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.41 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.35 |
| ▸ | CPT2 | P23786 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25527289 | 0.83 | HMGCR (0.38) | TSHRHMGCRCHRM1TBXA2RADRA1A | |
| SCHEMBL11965903 | 0.79 | TSHR (0.46) | TSHRHSD17B10 | |
| SCHEMBL25946692 | 0.78 | HMGCR (0.41) | TSHRHMGCRCHRM1TBXA2RADRA1A | |
| SCHEMBL27867631 | 0.76 | TSHR (0.42) | TSHRHSD17B10KDM4E | |
| SCHEMBL29034716 | 0.76 | HMGCR (0.42) | TSHRHMGCRCHRM1TBXA2RADRA1A | |
| SCHEMBL25527459 | 0.75 | TSHR (0.38) | TSHRHSD17B10HMGCRCHRM1TBXA2R | |
| SCHEMBL2963340 | 0.75 | HMGCR (0.46) | TSHRHSD17B10HMGCRCHRM1TBXA2R | |
| SCHEMBL12533541 | 0.74 | TSHR (0.41) | TSHRHSD17B10FFAR1CPT2TDP1 | |
| SCHEMBL11809503 | 0.74 | HMGCR (0.41) | TSHRHMGCRCHRM1TBXA2RADRA1A | |
| SCHEMBL1186918 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230152696-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |