⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25701246 | 0.84 | — | — | |
| SCHEMBL13057386 | 0.77 | — | — | |
| SCHEMBL25701216 | 0.74 | — | — | |
| SCHEMBL25701234 | 0.71 | — | — | |
| SCHEMBL13034846 | 0.71 | — | — | |
| SCHEMBL25701230 | 0.70 | — | — | |
| SCHEMBL25701227 | 0.69 | — | — | |
| SCHEMBL25701226 | 0.65 | — | — | |
| SCHEMBL19267385 | 0.61 | F2R (0.33) | — | |
| SCHEMBL13057384 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20230205084-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-06-29 | — | — | US | disclosed |