SCHEMBL25713690

SCHEMBL25713690

OCCOCCOCCOc1ccc(-c2nc3ccccc3s2)cc1-c1nc2ccccc2s1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 9/20 0.51
MAPT P10636 9/20 0.51
SMN1; SMN2 Q16637 8/20 0.51
NPC1 O15118 7/20 0.51
ALDH1A1 P00352 6/20 0.51
KMT2A Q03164 5/20 0.51
TP53 P04637 5/20 0.51
GLA P06280 4/20 0.51
MEN1 O00255 4/20 0.51
HPGD P15428 2/20 0.51
HCRTR1 O43613 2/20 0.51
HSD17B10 Q99714 2/20 0.51
NPSR1 Q6W5P4 2/20 0.51
MAPK1 P28482 1/20 0.51
BLM P54132 1/20 0.51
RAB9A P51151 8/20 0.48
GAA P10253 3/20 0.48
PPARG P37231 1/20 0.48
NCOA2 Q15596 1/20 0.48
NCOA1 Q15788 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22015453 0.94 MAPT (0.50) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015459 0.89 MAPT (0.51) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015994 0.88 MAPT (0.53) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015638 0.88 PTGS1 (0.54) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015466 0.88 APP (0.53) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL25711522 0.87 NPC1 (0.51) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL25713548 0.86 MAPT (0.48) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015837 0.86 KDM4E (0.48) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015996 0.86 SMN1; SMN2 (0.51) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1
SCHEMBL22015461 0.85 HDAC1 (0.49) KDM4EMAPTSMN1; SMN2NPC1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023120077-A1 COMPOSITION, AND PHOTOSENSITIVE COMPOSITION 東京応化工業株式会社 2023-06-29 WO disclosed