Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | PLA2G4B | P0C869 | 9/20 | 0.45 |
| ▸ | RARB | P10826 | 3/20 | 0.43 |
| ▸ | PLA2G4A | P47712 | 1/20 | 0.42 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | NR5A1 | Q13285 | 1/20 | 0.41 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3747621 | 0.97 | TP53 (0.47) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL3740933 | 0.92 | NR5A1 (0.48) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL3746859 | 0.90 | NR5A1 (0.48) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| Trifluoromethanesulfonic Acid SCHEMBL29504029 | 0.83 | NR5A1 (0.51) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL3416686 | 0.80 | RARB (0.43) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL3421587 | 0.76 | RARB (0.43) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL4127155 | 0.76 | NR5A1 (0.58) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL4118653 | 0.75 | NR5A1 (0.56) | TP53TSHRPLA2G4BRARBPLA2G4A | |
| SCHEMBL3872699 | 0.74 | PDK2 (0.41) | TP53TSHRPLA2G4BRARBNR5A1 | |
| SCHEMBL2437076 | 0.74 | NR5A1 (0.42) | TP53TSHRPLA2G4BRARBPLA2G4A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2384457-A2 | COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2011-11-09 | — | — | EP | disclosed |
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| WO-2010055406-A2 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-05-20 | — | — | WO | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |