SCHEMBL25736732

SCHEMBL25736732

CC(C)(C)OC(=O)NC12CC3CC(C1)CC(OC(=O)CS)(C3)C2

nearest known ligand 0.47

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
DPP9 Q86TI2 10/20 0.47
DPP8 Q6V1X1 9/20 0.47
MEN1 O00255 1/20 0.46
MAPK1 P28482 1/20 0.46
KMT2A Q03164 1/20 0.46
HDAC4 P56524 1/20 0.43
HDAC1 Q13547 1/20 0.43
EPHX2 P34913 3/20 0.40
CACNA1H O95180 1/20 0.39
GLMN Q92990 1/20 0.39
ITGB3 P05106 1/20 0.38
ITGA2B P08514 1/20 0.38
DPP4 P27487 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25736703 0.91 DPP9 (0.45) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL18776035 0.85 DPP9 (0.45) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL16540347 0.85 MEN1 (0.50) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL10447637 0.82 DPP9 (0.46) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL25736741 0.82 MEN1 (0.45) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL16259930 0.82 MEN1 (0.52) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL30684977 0.79 MEN1 (0.49) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL18785743 0.78 MEN1 (0.43) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL25736662 0.78 MEN1 (0.54) DPP9DPP8MEN1MAPK1KMT2A
SCHEMBL2845650 0.78 MEN1 (0.48) DPP9DPP8MEN1MAPK1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20230152698-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed