⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Cyclopropane SCHEMBL16192385 | 0.86 | — | — | |
| SCHEMBL3420598 | 0.84 | — | — | |
| SCHEMBL142217 | 0.74 | — | — | |
| SCHEMBL22534497 | 0.73 | — | — | |
| SCHEMBL3887394 | 0.73 | — | — | |
| SCHEMBL22716531 | 0.73 | TSHR (0.54) | — | |
| SCHEMBL5931955 | 0.71 | — | — | |
| Methane SCHEMBL20505387 | 0.71 | — | — | |
| SCHEMBL8418407 | 0.71 | — | — | |
| SCHEMBL2523246 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12062613-B2 | Semiconductor device having an extra low-k dielectric layer and method of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-08-13 | — | — | US | claimed |
| CN-117363158-B | Graphene-based coating for acid-base salt moisture environment and preparation method thereof | 铜陵有色金属集团铜冠建筑安装股份有限公司 | 2024-03-08 | — | — | CN | claimed |
| CN-117363158-A | Graphene-based coating for acid-base salt moisture environment and preparation method thereof | 铜陵有色金属集团铜冠建筑安装股份有限公司 | 2024-01-09 | — | — | CN | claimed |
| US-20230057382-A1 | SILYL TERMINATED POLYURETHANES AND INTERMEDIATES FOR THE PREPARATION THEREOF | HUNTSMAN INTERNATIONAL LLC (US) | 2023-02-23 | — | — | US | claimed |
| US-20220359412-A1 | SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND METHOD OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-11-10 | — | — | US | claimed |
| EP-4081569-A1 | SILYL TERMINATED POLYURETHANES AND INTERMEDIATES FOR THE PREPARATION THEREOF | Huntsman International LLC (US) | 2022-11-02 | — | — | EP | claimed |
| CN-115135688-A | Silyl-terminated polyurethanes and intermediates for their preparation | 亨茨曼国际有限公司 | 2022-09-30 | — | — | CN | claimed |
| US-11417602-B2 | Semiconductor device having an extra low-k dielectric layer and method of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-08-16 | — | — | US | claimed |
| US-20220213129-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR PRODUCING SILICON OXIDE FILM | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2022-07-07 | — | — | US | claimed |
| CN-113785085-A | Silicon oxide film, material for gas barrier film, and method for producing silicon oxide film | 东曹株式会社 | 2021-12-10 | — | — | CN | claimed |
| CN-108735712-B | Method for forming ultra-low dielectric constant inter-metal dielectric layer | 台湾积体电路制造股份有限公司 | 2021-07-27 | — | — | CN | claimed |
| WO-2021130094-A1 | SILYL TERMINATED POLYURETHANES AND INTERMEDIATES FOR THE PREPARATION THEREOF | HUNTSMAN INTERNATIONAL LLC (US) | 2021-07-01 | — | — | WO | claimed |
| US-20200335449-A1 | SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND METHOD OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-10-22 | — | — | US | claimed |
| WO-2020209202-A1 | SILICON OXIDE FILM, MATERIAL FOR GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SILICON OXIDE FILM | 東ソー株式会社 | 2020-10-15 | — | — | WO | claimed |
| US-10707165-B2 | Semiconductor device having an extra low-k dielectric layer and method of forming the same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2020-07-07 | — | — | US | claimed |
| US-20180308801-A1 | SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND METHOD OF FORMING THE SAME | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2018-10-25 | — | — | US | claimed |
| US-20260101742-A1 | STACKING VIA CONFIGURATION FOR ADVANCED SILICON NODE PRODUCTS AND METHODS FOR FORMING THE SAME | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2026-04-09 | — | — | US | disclosed |
| EP-4703405-A1 | CRYSTALLINE POLYOXYALKYLENE-BASED POLYMER AND CURABLE COMPOSITION COMPRISING SAME | Kaneka Corporation (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-0206817-A1 | Catalyst for producing olefin polymers and polymerization process using the catalyst | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1986-12-30 | — | — | EP | disclosed |
| EP-0196585-A2 | Catalyst and process for producing alpha-olefin polymers using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1986-10-08 | — | — | EP | disclosed |