SCHEMBL2580658

SCHEMBL2580658

C1=CCC(C2=CC=CC2)=C1.[MgH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27884552 0.96
SCHEMBL3187920 0.96
SCHEMBL315517 0.96
SCHEMBL8155562 0.93
SCHEMBL6078579 0.93
SCHEMBL7644379 0.93
SCHEMBL6551605 0.93
SCHEMBL6356245 0.93
SCHEMBL10689959 0.93
SCHEMBL11339091 0.93

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3271310-A1 PRODUCTION OF COMPOSITE SPINEL POWDERS IN CORE/SHELL STRUCTURE BY FLAME PYROLYSIS METHOD Anadolu Universitesi Rektorlugu (TR) 2018-01-24 EP claimed
WO-2016148664-A1 PRODUCTION OF COMPOSITE SPINEL POWDERS IN CORE/SHELL STRUCTURE BY FLAME PYROLYSIS METHOD ANADOLU UNIVERSITESI REKTORLUGU (TR) 2016-09-22 WO claimed
EP-0426747-B1 AVALANCHE PHOTODIODE STRUCTURE BRITISH TELECOMM (GB) 1996-11-06 EP claimed
US-12324278-B2 Semiconductor epitaxial structure and application and manufacturing methods thereof SHENZHEN JING XIANG TECHNOLOGIES CO., LTD. (CN) 2025-06-03 US disclosed
EP-3442038-B1 SEMICONDUCTOR WAFER STANLEY ELECTRIC CO LTD (JP) 2025-01-01 EP disclosed
EP-3514265-B1 LIGHT EMITTING DEVICE ADAPTED TO EMIT ULTRAVIOLET LIGHT STANLEY ELECTRIC CO LTD (JP) 2024-04-17 EP disclosed
US-20220223759-A1 SEMICONDUCTOR EPITAXIAL STRUCTURE AND APPLICATION AND MANUFACTURING METHODS THEREOF SHENZHEN JING XIANG TECHNOLOGIES CO., LTD. (CN) 2022-07-14 US disclosed
US-10770621-B2 Semiconductor wafer STANLEY ELECTRIC CO., LTD. (JP) 2020-09-08 US disclosed
US-10644199-B2 Group III nitride stacked body, and semiconductor device having the stacked body STANLEY ELECTRIC CO., LTD. (JP) 2020-05-05 US disclosed
US-20190229237-A1 GROUP III NITRIDE STACKED BODY, AND SEMICONDUCTOR DEVICE HAVING THE STACKED BODY STANLEY ELECTRIC CO., LTD. (JP) 2019-07-25 US disclosed
EP-3514265-A1 GROUP-III NITRIDE LAMINATE, AND SEMICONDUCTOR DEVICE HAVING LAMINATE Stanley Electric Co., Ltd. (JP) 2019-07-24 EP disclosed
EP-1248303-A1 LIGHT-EMITTING DEVICE Nichia Corporation (JP) 2002-10-09 EP disclosed
US-20020141469-A1 Nitride semiconductor laser device and optical information reproduction apparatus using the same Sharp Fukuyama Laser Co., Ltd. (JP) 2002-10-03 US disclosed
US-20020064195-A1 Semiconductor laser, semiconductor device and nitride series III-V group compound substrate, as well as manufacturing method thereof SONY CORPORATION (JP) 2002-05-30 US disclosed
WO-2002017369-A1 METHOD OF FABRICATING GROUP-III NITRIDE SEMICONDUCTOR CRYSTAL, METHO OF FABRICATING GALLIUM NITRIDE-BASED COMPOUND SEMICONDUCTOR, GALLIUM NITRIDE-BASED COMPOUND SEMICONDUCTOR, GALLIUM NITRIDE-BASED COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE, AND LIGHT SOURCE USING THE SEMICONDUCTOR LIGHT-EMITTING DEVICE SHOWA DENKO K.K. (JP) 2002-02-28 WO disclosed
US-6303404-B1 Method for fabricating white light emitting diode using InGaN phase separation HC SEMITEK CORPORATION (CN) 2001-10-16 US disclosed
US-5977565-A Semiconductor light emitting diode having a capacitor KABUSHIKI KAISHA TOSHIBA (JP) 1999-11-02 US disclosed
EP-0811251-A2 MULTICOLOR LIGHT EMITTING DIODE, METHODS FOR PRODUCING SAME AND MULTICOLOR DISPLAY INCORPORATING AN ARRAY OF SUCH LEDs Koninklijke Philips Electronics N.V. (NL) 1997-12-10 EP disclosed
WO-1997023912-A2 MULTICOLOR LIGHT EMITTING DIODE, METHODS FOR PRODUCING SAME AND MULTICOLOR DISPLAY INCORPORATING AN ARRAY OF SUCH LEDs PHILIPS ELECTRONICS N.V. (NL) 1997-07-03 WO disclosed
US-4927578-A APPLYING LIQUID ORGANOMETALLIC CATALYST MIXTURE TO SUBSTRATE, PLASMA POLYMERIZATION, TREATMENT WITH STRONG REDUCING AGENT, ORIENTATION BASF AKTIENGESELLSCHAFT (DE) 1990-05-22 US disclosed