⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7737776 | 0.97 | CYP2D6 (0.31) | — | |
| SCHEMBL258217 | 0.97 | CYP2D6 (0.31) | — | |
| SCHEMBL7741445 | 0.97 | CYP2D6 (0.31) | — | |
| SCHEMBL7739593 | 0.97 | CYP2D6 (0.31) | — | |
| SCHEMBL258304 | 0.97 | CYP2D6 (0.31) | — | |
| SCHEMBL27372972 | 0.95 | CYP2D6 (0.31) | — | |
| SCHEMBL5411605 | 0.94 | — | — | |
| SCHEMBL5410724 | 0.88 | — | — | |
| SCHEMBL487277 | 0.78 | CYP2D6 (0.38) | — | |
| SCHEMBL487345 | 0.76 | CYP2D6 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 634 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11693314-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| US-11340527-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-24 | — | — | US | claimed |
| EP-1096317-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-09-08 | — | — | EP | claimed |
| US-6596463-B2 | Photosensitivity, resolution, chemical resistance | SHIN-ETSU CHEMICAL, CO., LTD. (JP) | 2003-07-22 | — | — | US | claimed |
| EP-0156611-B1 | INTERMEDIATES FOR THE PREPARATION OF PROSTAGLANDIN ANALOGUES | ONO PHARMACEUTICAL CO., LTD. (JP) | 1988-06-01 | — | — | EP | claimed |
| US-4622410-A | CHEMICAL INTERMEDIATES FOR 6-KETO-PROSTAGLANDINS | ONO PHARMACEUTICAL CO. LTD. (JP) | 1986-11-11 | — | — | US | claimed |
| EP-0156611-A2 | Intermediates for the preparation of prostaglandin analogues | ONO PHARMACEUTICAL CO., LTD. (JP) | 1985-10-02 | — | — | EP | claimed |
| US-4399147-A | Prostaglandin 12 analogues and their pharmaceutical compositions | ONO PHARMACEUTICAL CO. LTD. (JP) | 1983-08-16 | — | — | US | claimed |
| US-4207332-A | Prostaglandin I2 analogues | ONO PHARMACEUTICAL CO., LTD. (JP) | 1980-06-10 | — | — | US | claimed |
| US-4178367-A | Prostaglandin I2 analogues | ONO PHARMACEUTICAL CO. LTD. (JP) | 1979-12-11 | — | — | US | claimed |
| US-20240210830-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240184200-A1 | AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| CN-118112887-A | Resist composition and pattern forming method | 信越化学工业株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-118005520-A | Amine compound, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2024-05-10 | — | — | CN | disclosed |
| US-11953827-B2 | Molecular resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-04-09 | — | — | US | disclosed |
| US-4622410-A | CHEMICAL INTERMEDIATES FOR 6-KETO-PROSTAGLANDINS | ONO PHARMACEUTICAL CO. LTD. (JP) | 1986-11-11 | — | — | US | disclosed |
| EP-0156611-A2 | Intermediates for the preparation of prostaglandin analogues | ONO PHARMACEUTICAL CO., LTD. (JP) | 1985-10-02 | — | — | EP | disclosed |
| US-4399147-A | Prostaglandin 12 analogues and their pharmaceutical compositions | ONO PHARMACEUTICAL CO. LTD. (JP) | 1983-08-16 | — | — | US | disclosed |
| US-4207332-A | Prostaglandin I2 analogues | ONO PHARMACEUTICAL CO., LTD. (JP) | 1980-06-10 | — | — | US | disclosed |
| US-4178367-A | Prostaglandin I2 analogues | ONO PHARMACEUTICAL CO. LTD. (JP) | 1979-12-11 | — | — | US | disclosed |