SCHEMBL25844740

SCHEMBL25844740

CC(C)(I)C(=O)OC1CC2CC(C(=O)OC(CS(=O)(=O)O)C(F)(F)F)C1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25844943 0.90 — —
SCHEMBL26312791 0.86 — —
SCHEMBL23963414 0.82 — —
SCHEMBL24452807 0.77 — —
SCHEMBL19756035 0.77 — —
SCHEMBL25844666 0.74 — —
SCHEMBL25844738 0.74 — —
SCHEMBL25476164 0.72 — —
SCHEMBL24861645 0.70 POLB (0.37) —
SCHEMBL19967859 0.70 POLB (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709426-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 — — US disclosed
Send feedback